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JP12 patents
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US8122390B2Feb 21, 2012
Charged particle beam writing apparatus, and apparatus and method for correcting dimension error of pattern
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Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
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US8669537B2Mar 11, 2014
Charged particle beam writing apparatus and method
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US8563952B2Oct 22, 2013
Charged particle beam writing apparatus
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US8878149B2Nov 4, 2014
Charged particle beam writing apparatus and charged particle beam writing method
YASHIMA JUN2 citations62
US8429575B2Apr 23, 2013
Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
YASHIMA JUN3 citations62
US8183545B2May 22, 2012
Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing
YASHIMA JUN5 citations62
US8527913B2Sep 3, 2013
Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
YASHIMA JUN1 citations52
US8466440B2Jun 18, 2013
Charged particle beam drawing apparatus and control method thereof
YASHIMA JUN2 citations51
US9188853B2Nov 17, 2015
Charged particle beam drawing apparatus and control method thereof
YASHIMA JUN0 citations41
US9006691B2Apr 14, 2015
Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block
YASHIMA JUN0 citations41
US8796650B2Aug 5, 2014
Charged particle beam drawing method and apparatus
YASHIMA JUN0 citations41