Assignee
ZEISS CARL SMT GMBH
DE·1,039 granted patents·462 pending applications·1,419 citations·filing 2004–2025
Top patents by PatentIndex Score
1,501 records- 0198US10527832B2Imaging optical unit and projection exposure apparatus including sameZEISS CARL SMT GMBH·Filed 2017·Granted Jan 7, 2020·23 cites·20 claims
- 0298US9599904B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 21, 2017·15 cites·20 claims
- 0397US11003088B2Method and device for the correction of imaging defectsZEISS CARL SMT GMBH·Filed 2020·Granted May 11, 2021·6 cites·20 claims
- 0497US8004755B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT GMBH·Filed 2010·Granted Aug 23, 2011·12 cites·17 claims
- 0596US11525946B2Method for in situ protection of an aluminum layer and optical arrangement for the VUV wavelength rangeZEISS CARL SMT GMBH·Filed 2021·Granted Dec 13, 2022·5 cites·11 claims
- 0696US11194256B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 7, 2021·5 cites·20 claims
- 0796US9366968B2Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methodsZEISS CARL SMT GMBH·Filed 2013·Granted Jun 14, 2016·20 cites·25 claims
- 0896US9235136B2Projection exposure apparatus for projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Jan 12, 2016·12 cites·20 claims
- 0995US11415895B2Compensation of creep effects in an imaging deviceZEISS CARL SMT GMBH·Filed 2021·Granted Aug 16, 2022·4 cites·20 claims
- 1095US11169445B2Pupil facet mirror, optical system and illumination optics for a projection lithography systemZEISS CARL SMT GMBH·Filed 2020·Granted Nov 9, 2021·3 cites·21 claims
- 1195US10120176B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2017·Granted Nov 6, 2018·4 cites·17 claims
- 1294US11650510B2Projection optical unit for microlithography and method for producing a structured componentZEISS CARL SMT GMBH·Filed 2021·Granted May 16, 2023·2 cites·20 claims
- 1394US9651872B2Projection lens with wavefront manipulatorZEISS CARL SMT GMBH·Filed 2015·Granted May 16, 2017·6 cites·17 claims
- 1494US8039813B2Charged particle-optical systems, methods and componentsZEISS CARL SMT GMBH·Filed 2006·Granted Oct 18, 2011·32 cites·57 claims
- 1594US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 1693US11809085B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Nov 7, 2023·2 cites·22 claims
- 1793US11774237B2Method for calibrating a measuring apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Oct 3, 2023·3 cites·12 claims
- 1893US11372341B2Method for temperature control of a componentZEISS CARL SMT GMBH·Filed 2021·Granted Jun 28, 2022·3 cites·20 claims
- 1993US10656400B2Imaging optical unit and projection exposure unit including sameZEISS CARL SMT GMBH·Filed 2017·Granted May 19, 2020·7 cites·20 claims
- 2093US10545323B2Projection optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Jan 28, 2020·13 cites·21 claims
- 2193US10068325B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Sep 4, 2018·10 cites·20 claims
- 2293US9939730B2Optical assemblyZEISS CARL SMT GMBH·Filed 2015·Granted Apr 10, 2018·7 cites·31 claims
- 2393US9880474B2System for producing structures in a substrateZEISS CARL SMT GMBH·Filed 2015·Granted Jan 30, 2018·6 cites·20 claims
- 2493US9760019B2Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Sep 12, 2017·6 cites·23 claims
- 2593US9703206B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 11, 2017·4 cites·30 claims
- 2693US7982854B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemZEISS CARL SMT GMBH·Filed 2006·Granted Jul 19, 2011·15 cites·12 claims
- 2793US7859748B2Microlithographic reduction projection catadioptric objectiveZEISS CARL SMT GMBH·Filed 2007·Granted Dec 28, 2010·21 cites·20 claims
- 2892US11630124B2Device and method for operating a bending beam in a closed control loopZEISS CARL SMT GMBH·Filed 2021·Granted Apr 18, 2023·3 cites·21 claims
- 2992US10146033B2Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unitZEISS CARL SMT GMBH·Filed 2015·Granted Dec 4, 2018·5 cites·24 claims
- 3092US10108085B2Method for localizing defects on substratesZEISS CARL SMT GMBH·Filed 2017·Granted Oct 23, 2018·13 cites·20 claims
- 3192US10061192B2Method and apparatus for correcting errors on a wafer processed by a photolithographic maskZEISS CARL SMT GMBH·Filed 2016·Granted Aug 28, 2018·6 cites·23 claims
- 3292US10042248B2Illumination optical unit for a mask inspection system and mask inspection system with such an illumination optical unitZEISS CARL SMT GMBH·Filed 2015·Granted Aug 7, 2018·22 cites·20 claims
- 3392US9766549B2Optical apparatus with adjustable action of force on an optical moduleZEISS CARL SMT GMBH·Filed 2015·Granted Sep 19, 2017·4 cites·27 claims
- 3492US9442393B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2014·Granted Sep 13, 2016·5 cites·20 claims
- 3592US9170497B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2013·Granted Oct 27, 2015·7 cites·21 claims
- 3692US8811568B2Correction of optical elements by correction light irradiated in a flat mannerZEISS CARL SMT GMBH·Filed 2013·Granted Aug 19, 2014·5 cites·24 claims
- 3792US8760777B2Positioning unit and apparatus for adjustment of an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Jun 24, 2014·4 cites·21 claims
- 3892US8035903B2Positioning unit and alignment device for an optical elementZEISS CARL SMT GMBH·Filed 2010·Granted Oct 11, 2011·9 cites·13 claims
- 3991US10337850B2Interferometric measuring arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Jul 2, 2019·10 cites·13 claims
- 4091US9983484B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted May 29, 2018·5 cites·20 claims
- 4191US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 4291US7990622B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2010·Granted Aug 2, 2011·7 cites·47 claims
- 4391US7936521B2Method of measuring a deviation of an optical surface from a target shapeZEISS CARL SMT GMBH·Filed 2010·Granted May 3, 2011·9 cites·13 claims
- 4490US10606048B2Imaging optical unit for a metrology system for examining a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Mar 31, 2020·3 cites·21 claims
- 4590US10401540B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Sep 3, 2019·3 cites·21 claims
- 4690US10048592B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Aug 14, 2018·4 cites·22 claims
- 4790US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 4890US9535332B2Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a maskZEISS CARL SMT GMBH·Filed 2012·Granted Jan 3, 2017·6 cites·30 claims
- 4990US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 5090US8345350B2Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2009·Granted Jan 1, 2013·20 cites·42 claims
Showing the top 50 of 1,501 patent records by PatentIndex Score.
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