Assignee
ADVANCED ION BEAM TECHNOLOGY I
TW·21 granted patents·4 pending applications·382 citations·filing 1999–2009
Top patents by PatentIndex Score
25 records- 0197US7326941B2Apparatus and methods for ion beam implantation using ribbon and spot beamsADVANCED ION BEAM TECHNOLOGY I·Filed 2005·Granted Feb 5, 2008·49 cites·20 claims
- 0292US6710358B1Apparatus and method for reducing energy contamination of low energy ion beamsADVANCED ION BEAM TECHNOLOGY I·Filed 2000·Granted Mar 23, 2004·44 cites·20 claims
- 0388US7750323B1Ion implanter and method for implanting a waferADVANCED ION BEAM TECHNOLOGY I·Filed 2009·Granted Jul 6, 2010·13 cites·29 claims
- 0488US6489622B1Apparatus for decelerating ion beams with minimal energy contaminationADVANCED ION BEAM TECHNOLOGY I·Filed 2000·Granted Dec 3, 2002·44 cites·20 claims
- 0588US6338775B1Apparatus and method for uniformly depositing thin films over substratesADVANCED ION BEAM TECHNOLOGY I·Filed 2000·Granted Jan 15, 2002·36 cites·24 claims
- 0683US7745804B1Ion implantation method and application thereofADVANCED ION BEAM TECHNOLOGY I·Filed 2009·Granted Jun 29, 2010·8 cites·20 claims
- 0783US6946667B2Apparatus to decelerate and control ion beams to improve the total quality of ion implantationADVANCED ION BEAM TECHNOLOGY I·Filed 2002·Granted Sep 20, 2005·30 cites·27 claims
- 0883US6806479B1Apparatus and method for reducing implant angle variations across a large wafer for a batch diskADVANCED ION BEAM TECHNOLOGY I·Filed 2003·Granted Oct 19, 2004·18 cites·32 claims
- 0983US6403967B1Magnet system for an ion beam implantation system using high perveance beamsADVANCED ION BEAM TECHNOLOGY I·Filed 1999·Granted Jun 11, 2002·48 cites·20 claims
- 1079US6313428B1Apparatus and method for reducing space charge of ion beams and wafer chargingADVANCED ION BEAM TECHNOLOGY I·Filed 1999·Granted Nov 6, 2001·39 cites·35 claims
- 1178US7675050B2Apparatus and method for ion beam implantation using ribbon and spot beamsADVANCED ION BEAM TECHNOLOGY I·Filed 2007·Granted Mar 9, 2010·4 cites·27 claims
- 1277US6918351B2Apparatus for ion beam implantationADVANCED ION BEAM TECHNOLOGY I·Filed 2002·Granted Jul 19, 2005·12 cites·32 claims
- 1376US7807986B1Ion implanter and method for adjusting ion beamADVANCED ION BEAM TECHNOLOGY I·Filed 2009·Granted Oct 5, 2010·5 cites·25 claims
- 1472US7772571B2Implant beam utilization in an ion implanterADVANCED ION BEAM TECHNOLOGY I·Filed 2007·Granted Aug 10, 2010·4 cites·14 claims
- 1569US7709364B1Method and apparatus for low temperature ion implantationADVANCED ION BEAM TECHNOLOGY I·Filed 2009·Granted May 4, 2010·4 cites·13 claims
- 1668US7740247B2Compound sliding seal unit suitable for atmosphere to vacuum applicationsADVANCED ION BEAM TECHNOLOGY I·Filed 2008·Granted Jun 22, 2010·2 cites·21 claims
- 1763US7683350B2Ion implantation methodADVANCED ION BEAM TECHNOLOGY I·Filed 2008·Granted Mar 23, 2010·2 cites·11 claims
- 1861US6326746B1High efficiency resonator for linear acceleratorADVANCED ION BEAM TECHNOLOGY I·Filed 2000·Granted Dec 4, 2001·12 cites·20 claims
- 1958US6865065B1Semiconductor processing chamber substrate holder method and structureADVANCED ION BEAM TECHNOLOGY I·Filed 2002·Granted Mar 8, 2005·8 cites·20 claims
- 2052US7687784B2Method and device of ion source generationADVANCED ION BEAM TECHNOLOGY I·Filed 2008·Granted Mar 30, 2010·0 cites·16 claims
- 2146US7211811B2Method for preventing wafer surface from bombardment by micro-dust particles during the ion implantation processADVANCED ION BEAM TECHNOLOGY I·Filed 2005·Granted May 1, 2007·0 cites·4 claims
- 2242US2006163490A1Ion implantation cooling systemADVANCED ION BEAM TECHNOLOGY I·Filed 2006·Application pending·0 cites
- 2340US2006102080A1Reduced particle generation from wafer contacting surfaces on wafer paddle and handling facilitiesADVANCED ION BEAM TECHNOLOGY I·Filed 2004·Application pending·0 cites
- 2439US2004244692A1Method to accurately and repeatably setup an ion beam for an ion implantation system in reduced setup time to increase productivityADVANCED ION BEAM TECHNOLOGY I·Filed 2003·Application pending·0 cites
- 2537US2005019697A1Method of treating wafers with photoresist to perform metrology analysis using large current e-beam systemsADVANCED ION BEAM TECHNOLOGY I·Filed 2003·Application pending·0 cites
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