Assignee
ADVANCED TEHNOLOGY MATERIALS I
US·2 granted patents·140 citations·filing 2001–2005
Top patents by PatentIndex Score
2 records- 0195US6869638B2Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using sameADVANCED TEHNOLOGY MATERIALS I·Filed 2001·Granted Mar 22, 2005·108 cites·46 claims
- 0292US7365045B2Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxideADVANCED TEHNOLOGY MATERIALS I·Filed 2005·Granted Apr 29, 2008·32 cites·14 claims
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