Assignee
AIXTRON INC
US·9 granted patents·4 pending applications·89 citations·filing 2004–2016
Top patents by PatentIndex Score
13 records- 0192US7981472B2Methods of providing uniform gas delivery to a reactorAIXTRON INC·Filed 2009·Granted Jul 19, 2011·13 cites·15 claims
- 0290US7981473B2Transient enhanced atomic layer depositionAIXTRON INC·Filed 2004·Granted Jul 19, 2011·63 cites·19 claims
- 0381US9096933B2Methods for plasma processingAIXTRON INC·Filed 2014·Granted Aug 4, 2015·3 cites·21 claims
- 0470US9299956B2Method for deposition of high-performance coatings and encapsulated electronic devicesAIXTRON INC·Filed 2013·Granted Mar 29, 2016·2 cites·21 claims
- 0570US9096932B2Methods for plasma processingAIXTRON INC·Filed 2014·Granted Aug 4, 2015·1 cites·34 claims
- 0669US9359674B2Apparatus and method for dielectric depositionAIXTRON INC·Filed 2014·Granted Jun 7, 2016·0 cites·5 claims
- 0761US8906456B2Apparatus and method for high-throughput chemical vapor depositionAIXTRON INC·Filed 2013·Granted Dec 9, 2014·0 cites·10 claims
- 0858US9564329B2Method and apparatus for fabricating dielectric structuresAIXTRON INC·Filed 2014·Granted Feb 7, 2017·1 cites·18 claims
- 0956US7732308B2Process for depositing layers containing silicon and germaniumAIXTRON INC·Filed 2005·Granted Jun 8, 2010·6 cites·29 claims
- 1051US2009110805A1Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process ChamberAIXTRON INC·Filed 2007·Application pending·0 cites
- 1148US2009283040A1Device for temperature-controlled accommodation of a containerAIXTRON INC·Filed 2005·Application pending·0 cites
- 1247US2016289837A1Apparatus and method for forming thin protective and optical layers on substratesAIXTRON INC·Filed 2016·Application pending·0 cites
- 1341US2008206464A1Method and Device for the Depositing of Gallium Nitrite Layers on a Sapphire Substrate and Associated Substrate HolderAIXTRON INC·Filed 2005·Application pending·0 cites
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