Assignee
ANGSTRON SYSTEMS INC
US·4 granted patents·1 pending application·1,801 citations·filing 2001–2002
Top patents by PatentIndex Score
5 records- 0199US6428859B1Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)ANGSTRON SYSTEMS INC·Filed 2001·Granted Aug 6, 2002·810 cites·51 claims
- 0298US6569501B2Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)ANGSTRON SYSTEMS INC·Filed 2002·Granted May 27, 2003·238 cites·53 claims
- 0398US6416822B1Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)ANGSTRON SYSTEMS INC·Filed 2001·Granted Jul 9, 2002·416 cites·64 claims
- 0497US6630201B2Adsorption process for atomic layer depositionANGSTRON SYSTEMS INC·Filed 2001·Granted Oct 7, 2003·337 cites·20 claims
- 0540US2002144786A1Substrate temperature control in an ALD reactorANGSTRON SYSTEMS INC·Filed 2001·Application pending·0 cites
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