Assignee
APPLIED KOMATSU TECHNOLOGY INC
JP·56 granted patents·1 pending application·5,026 citations·filing 1994–2005
Top patents by PatentIndex Score
57 records- 0199US6182603B1Surface-treated shower head for use in a substrate processing chamberAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Feb 6, 2001·692 cites·6 claims
- 0298US5788778ADeposition chamber cleaning technique using a high power remote excitation sourceAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Aug 4, 1998·281 cites·21 claims
- 0397US6235634B1Modular substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted May 22, 2001·420 cites·83 claims
- 0497US6079693AIsolation valvesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Jun 27, 2000·95 cites·17 claims
- 0597US5716133AShielded heat sensor for measuring temperatureAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Feb 10, 1998·524 cites·20 claims
- 0696US6206176B1Substrate transfer shuttle having a magnetic driveAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Mar 27, 2001·191 cites·13 claims
- 0796US5518593AShield configuration for vacuum chamberAPPLIED KOMATSU TECHNOLOGY INC·Filed 1994·Granted May 21, 1996·105 cites·34 claims
- 0895US6534007B1Method and apparatus for detecting the endpoint of a chamber cleaningAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Mar 18, 2003·98 cites·15 claims
- 0995US6435868B2Multi-function chamber for a substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Aug 20, 2002·79 cites·25 claims
- 1095US6055927AApparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted May 2, 2000·129 cites·15 claims
- 1195US6024044ADual frequency excitation of plasma for film depositionAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Feb 15, 2000·184 cites·7 claims
- 1294US6213704B1Method and apparatus for substrate transfer and processingAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Apr 10, 2001·144 cites·27 claims
- 1393US6647993B2Surface-treated shower head for use in a substrate processing chamberAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Nov 18, 2003·48 cites·3 claims
- 1492US6552297B2RF matching network with distributed outputsAPPLIED KOMATSU TECHNOLOGY INC·Filed 2001·Granted Apr 22, 2003·36 cites·38 claims
- 1592US6359250B1RF matching network with distributed outputsAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Mar 19, 2002·37 cites·36 claims
- 1692US6086362AMulti-function chamber for a substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Jul 11, 2000·105 cites·49 claims
- 1792US5855744ANon-planar magnet tracking during magnetron sputteringAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Jan 5, 1999·132 cites·42 claims
- 1891US6355108B1Film deposition using a finger type shadow frameAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Mar 12, 2002·90 cites·27 claims
- 1991US6286230B1Method of controlling gas flow in a substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Sep 11, 2001·101 cites·38 claims
- 2091US6199259B1Autoclave bonding of sputtering target assemblyAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Mar 13, 2001·76 cites·32 claims
- 2191US6193507B1Multi-function chamber for a substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Feb 27, 2001·47 cites·12 claims
- 2289US6215897B1Automated substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Apr 10, 2001·87 cites·17 claims
- 2389US6016611AGas flow control in a substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Jan 25, 2000·88 cites·11 claims
- 2489US5844205AHeated substrate support structureAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Dec 1, 1998·114 cites·19 claims
- 2588US6517303B1Substrate transfer shuttleAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Feb 11, 2003·79 cites·38 claims
- 2688US6471459B2Substrate transfer shuttle having a magnetic driveAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Oct 29, 2002·72 cites·21 claims
- 2788US6371712B1Support frame for substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Apr 16, 2002·38 cites·19 claims
- 2888US6267851B1Tilted sputtering target with shield to block contaminantsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Jul 31, 2001·56 cites·23 claims
- 2988US6176668B1In-situ substrate transfer shuttleAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Jan 23, 2001·95 cites·7 claims
- 3084US6308932B1Isolation valvesAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Oct 30, 2001·23 cites·19 claims
- 3182US5892328AHigh-power, plasma-based, reactive species generatorAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Apr 6, 1999·37 cites·23 claims
- 3281US5895549AMethod and apparatus for etching film layers on large substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Apr 20, 1999·62 cites·10 claims
- 3381US5895937ATapered dielectric etch in semiconductor devicesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Apr 20, 1999·52 cites·17 claims
- 3481US5607602AHigh-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gasAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Mar 4, 1997·63 cites·28 claims
- 3578US6468601B1Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Oct 22, 2002·14 cites·14 claims
- 3678US6204607B1Plasma source with multiple magnetic flux sources each having a ferromagnetic coreAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Mar 20, 2001·67 cites·16 claims
- 3776US5902650AMethod of depositing amorphous silicon based films having controlled conductivityAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted May 11, 1999·44 cites·21 claims
- 3875US6036876ADry-etching of indium and tin oxidesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Mar 14, 2000·48 cites·15 claims
- 3974US6149365ASupport frame for substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Nov 21, 2000·37 cites·22 claims
- 4071US6432203B1Heated and cooled vacuum chamber shieldAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Aug 13, 2002·32 cites·12 claims
- 4167US6257045B1Automated substrate processing systems and methodsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Jul 10, 2001·31 cites·29 claims
- 4266US5895548AHigh power microwave plasma applicatorAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Apr 20, 1999·18 cites·31 claims
- 4365US5843277ADry-etch of indium and tin oxides with C2H5I gasAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Dec 1, 1998·30 cites·24 claims
- 4464US5753133AMethod and apparatus for etching film layers on large substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1994·Granted May 19, 1998·36 cites·35 claims
- 4563US6177023B1Method and apparatus for electrostatically maintaining substrate flatnessAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Jan 23, 2001·19 cites·16 claims
- 4663US5980686ASystem and method for gas distribution in a dry etch processAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Nov 9, 1999·22 cites·19 claims
- 4760US5977519AHeating element with a diamond sealing materialAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Nov 2, 1999·18 cites·5 claims
- 4859US6205870B1Automated substrate processing systems and methodsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Mar 27, 2001·22 cites·22 claims
- 4957US5893757ATapered profile etching methodAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Apr 13, 1999·21 cites·36 claims
- 5054US6294219B1Method of annealing large area glass substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Sep 25, 2001·17 cites·7 claims
Showing the top 50 of 57 patent records by PatentIndex Score.
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