Assignee
ASML HOLDING NV
NL·472 granted patents·76 pending applications·4,924 citations·filing 1999–2025
Top patents by PatentIndex Score
548 records- 0199US6867844B2Immersion photolithography system and method using microchannel nozzlesASML HOLDING NV·Filed 2003·Granted Mar 15, 2005·407 cites·40 claims
- 0299US6809794B1Immersion photolithography system and method using inverted wafer-projection optics interfaceASML HOLDING NV·Filed 2003·Granted Oct 26, 2004·278 cites·42 claims
- 0399US6611316B2Method and system for dual reticle image exposureASML HOLDING NV·Filed 2002·Granted Aug 26, 2003·717 cites·14 claims
- 0497US7063920B2Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systemsASML HOLDING NV·Filed 2003·Granted Jun 20, 2006·211 cites·22 claims
- 0597US7025498B2System and method of measuring thermal expansionASML HOLDING NV·Filed 2003·Granted Apr 11, 2006·156 cites·14 claims
- 0696US7445883B2Lithographic printing with polarized lightASML HOLDING NV·Filed 2006·Granted Nov 4, 2008·46 cites·19 claims
- 0795US7400382B2Light patterning device using tilting mirrors in a superpixel formASML HOLDING NV·Filed 2005·Granted Jul 15, 2008·24 cites·29 claims
- 0895US7363854B2System and method for patterning both sides of a substrate utilizing imprint lithographyASML HOLDING NV·Filed 2005·Granted Apr 29, 2008·37 cites·22 claims
- 0995US7234514B2Methods and systems for compact, micro-channel laminar heat exchangingASML HOLDING NV·Filed 2004·Granted Jun 26, 2007·44 cites·22 claims
- 1095US6980277B2Immersion photolithography system and method using inverted wafer-projection optics interfaceASML HOLDING NV·Filed 2004·Granted Dec 27, 2005·49 cites·35 claims
- 1195US6826451B2Lithography tool having a vacuum reticle library coupled to a vacuum chamberASML HOLDING NV·Filed 2002·Granted Nov 30, 2004·67 cites·48 claims
- 1295US6680798B2Optical reduction system with control of illumination polarizationASML HOLDING NV·Filed 2001·Granted Jan 20, 2004·65 cites·8 claims
- 1394US7869003B2Lithographic apparatus and device manufacturing method with reticle gripperASML HOLDING NV·Filed 2006·Granted Jan 11, 2011·32 cites·21 claims
- 1494US7411650B2Immersion photolithography system and method using microchannel nozzlesASML HOLDING NV·Filed 2005·Granted Aug 12, 2008·14 cites·20 claims
- 1594US7209220B2System for using a two part cover for and a box for protecting a reticleASML HOLDING NV·Filed 2005·Granted Apr 24, 2007·37 cites·26 claims
- 1694US6906783B2System for using a two part cover for protecting a reticleASML HOLDING NV·Filed 2003·Granted Jun 14, 2005·79 cites·22 claims
- 1793US7561252B2Interferometric lithography system and method used to generate equal path lengths of interfering beamsASML HOLDING NV·Filed 2005·Granted Jul 14, 2009·18 cites·36 claims
- 1893US7239446B2Optical reduction system with control of illumination polarizationASML HOLDING NV·Filed 2003·Granted Jul 3, 2007·39 cites·13 claims
- 1993US7031077B2Optical reduction method with elimination of reticle diffraction induced biasASML HOLDING NV·Filed 2004·Granted Apr 18, 2006·37 cites·7 claims
- 2092US7133121B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2005·Granted Nov 7, 2006·13 cites·10 claims
- 2192US7053990B2System to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2005·Granted May 30, 2006·17 cites·4 claims
- 2292US6912043B2Removable reticle window and support frame using magnetic forceASML HOLDING NV·Filed 2003·Granted Jun 28, 2005·35 cites·30 claims
- 2392US6831768B1Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithographyASML HOLDING NV·Filed 2003·Granted Dec 14, 2004·39 cites·21 claims
- 2491US7506299B2Feature optimization using interference mapping lithographyASML HOLDING NV·Filed 2004·Granted Mar 17, 2009·46 cites·30 claims
- 2591US6770424B2Wafer track apparatus and methods for dispensing fluids with rotatable dispense armsASML HOLDING NV·Filed 2002·Granted Aug 3, 2004·54 cites·30 claims
- 2690US12306541B2Lithographic apparatus, metrology systems, illumination switches and methods thereofASML HOLDING NV·Filed 2021·Granted May 20, 2025·2 cites·20 claims
- 2790US12124177B2Overlay measurement system using lock-in amplifier techniqueASML HOLDING NV·Filed 2020·Granted Oct 22, 2024·2 cites·21 claims
- 2890US10324383B2Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatusASML HOLDING NV·Filed 2016·Granted Jun 18, 2019·5 cites·24 claims
- 2990US9605947B2Position measurement with illumination profile having regions confined to peripheral portion of pupilASML HOLDING NV·Filed 2013·Granted Mar 28, 2017·10 cites·19 claims
- 3090US7158238B2System and method for calibrating a spatial light modulator array using shearing interferometryASML HOLDING NV·Filed 2005·Granted Jan 2, 2007·11 cites·22 claims
- 3190US6876440B1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·22 cites·15 claims
- 3290US6836380B2Optical reduction system with elimination of reticle diffraction induced biasASML HOLDING NV·Filed 2003·Granted Dec 28, 2004·27 cites·10 claims
- 3389US7768653B2Method and system for wavefront measurements of an optical systemASML HOLDING NV·Filed 2008·Granted Aug 3, 2010·9 cites·20 claims
- 3489US7375791B2Laminar flow gas curtains for lithographic applicationsASML HOLDING NV·Filed 2005·Granted May 20, 2008·14 cites·20 claims
- 3589US7259831B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuationASML HOLDING NV·Filed 2006·Granted Aug 21, 2007·8 cites·7 claims
- 3689US7249925B2System and method for reticle protection and transportASML HOLDING NV·Filed 2005·Granted Jul 31, 2007·14 cites·20 claims
- 3789US7061591B2Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2003·Granted Jun 13, 2006·24 cites·13 claims
- 3889US6847461B1System and method for calibrating a spatial light modulator array using shearing interferometryASML HOLDING NV·Filed 2004·Granted Jan 25, 2005·27 cites·23 claims
- 3989US6778258B2Wafer handling system for use in lithography patterningASML HOLDING NV·Filed 2001·Granted Aug 17, 2004·35 cites·28 claims
- 4089US6760167B2Apparatus, system, and method for precision positioning and alignment of a lens in an optical systemASML HOLDING NV·Filed 2003·Granted Jul 6, 2004·42 cites·19 claims
- 4189US6731374B1Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic systemASML HOLDING NV·Filed 2002·Granted May 4, 2004·35 cites·23 claims
- 4288US11971665B2Wafer alignment using form birefringence of targets or productASML HOLDING NV·Filed 2020·Granted Apr 30, 2024·2 cites·16 claims
- 4388US10001713B2Lithographic apparatus and methodASML HOLDING NV·Filed 2014·Granted Jun 19, 2018·7 cites·15 claims
- 4488US9632434B2Reticle cooling system in a lithographic apparatusASML HOLDING NV·Filed 2015·Granted Apr 25, 2017·3 cites·20 claims
- 4588US7545585B2Uniformity correction system having light leak and shadow compensationASML HOLDING NV·Filed 2006·Granted Jun 9, 2009·8 cites·15 claims
- 4688US7354169B2Pattern generator using a dual phase step element and method of using sameASML HOLDING NV·Filed 2007·Granted Apr 8, 2008·9 cites·9 claims
- 4788US7321605B2Helical optical pulse stretcherASML HOLDING NV·Filed 2004·Granted Jan 22, 2008·24 cites·11 claims
- 4888US7163301B2Method and apparatus for managing actinic intensity transients in a lithography mirrorASML HOLDING NV·Filed 2005·Granted Jan 16, 2007·11 cites·11 claims
- 4988US7158215B2Large field of view protection optical system with aberration correctability for flat panel displaysASML HOLDING NV·Filed 2004·Granted Jan 2, 2007·27 cites·77 claims
- 5088US7124624B2High-resolution gas gauge proximity sensorASML HOLDING NV·Filed 2005·Granted Oct 24, 2006·10 cites·19 claims
Showing the top 50 of 548 patent records by PatentIndex Score.
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