Assignee

BEST MARGARET E

US·1 granted patent·0 citations·filing 2008–2008

Technology mixB82Y1 C08G1 C08L1 C09D1 G03F1

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0144US8262975B2Self-releasing resist material for nano-imprint processesBEST MARGARET E·Filed 2008·Granted Sep 11, 2012·0 cites·15 claims

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