Assignee
BOOTH JEAN-PAUL
FR·10 granted patents·47 citations·filing 2008–2012
Top patents by PatentIndex Score
10 records- 0191US9129779B2Processing system for detecting in-situ arcing events during substrate processingBOOTH JEAN-PAUL·Filed 2012·Granted Sep 8, 2015·9 cites·20 claims
- 0286US8179152B2Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted May 15, 2012·8 cites·13 claims
- 0383US9153421B2Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2012·Granted Oct 6, 2015·5 cites·20 claims
- 0476US8159233B2Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 17, 2012·6 cites·20 claims
- 0575US8164349B2Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereofBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·8 cites·20 claims
- 0670US8780522B2Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereofBOOTH JEAN-PAUL·Filed 2009·Granted Jul 15, 2014·3 cites·20 claims
- 0769US8968838B2Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitationBOOTH JEAN-PAUL·Filed 2011·Granted Mar 3, 2015·2 cites·14 claims
- 0865US8894804B2Plasma unconfinement sensor and methods thereofBOOTH JEAN-PAUL·Filed 2008·Granted Nov 25, 2014·1 cites·29 claims
- 0964US8547085B2Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Oct 1, 2013·4 cites·4 claims
- 1061US8164353B2RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·1 cites·20 claims
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