Assignee

BRINK MARKUS

US·2 granted patents·10 citations·filing 2011–2011

Technology mixH01L2 H10P2 G03F1 H10W1 Y10T1

Top patents by PatentIndex Score

2 records

0184US9190316B2Low energy etch process for nitrogen-containing dielectric layerBRINK MARKUS·Filed 2011·Granted Nov 17, 2015·6 cites·15 claims
0277US8916054B2High fidelity patterning employing a fluorohydrocarbon-containing polymerBRINK MARKUS·Filed 2011·Granted Dec 23, 2014·4 cites·12 claims

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