Assignee
CENTROTHERM INT AG
DE·6 granted patents·8 pending applications·4 citations·filing 2016–2024
Top patents by PatentIndex Score
14 records- 0171US2024429026A1Plasma generator, plasma treatment device, and method for providing electric power in a pulsed mannerCENTROTHERM INT AG·Filed 2024·Application pending·0 cites
- 0270US11355316B2Plasma generator, plasma treatment device, and method for providing electric power in a pulsed mannerCENTROTHERM INT AG·Filed 2018·Granted Jun 7, 2022·2 cites·19 claims
- 0364US12087544B2Plasma generator, plasma treatment device, and method for providing electric power in a pulsed mannerCENTROTHERM INT AG·Filed 2022·Granted Sep 10, 2024·0 cites·17 claims
- 0464US10636934B2Method and device for passivating defects in semiconductor substratesCENTROTHERM INT AG·Filed 2016·Granted Apr 28, 2020·2 cites·28 claims
- 0556US11486059B2Method and device for stabilizing precursor fibers for the production of carbon fibersCENTROTHERM INT AG·Filed 2019·Granted Nov 1, 2022·0 cites·22 claims
- 0655US12378701B2Method and device for stabilizing precursor fibers or films for producing carbon fibers or filmsCENTROTHERM INT AG·Filed 2019·Granted Aug 5, 2025·0 cites·21 claims
- 0752US2024355649A1Process assembly for semiconductor processing and semiconductor processing methodCENTROTHERM INT AG·Filed 2023·Application pending·0 cites
- 0849US2026042226A1End effector and robot having an end effectorCENTROTHERM INT AG·Filed 2023·Application pending·0 cites
- 0942US12454756B2Device, system and method for plasma-enhanced chemical vapor depositionCENTROTHERM INT AG·Filed 2021·Granted Oct 28, 2025·0 cites·14 claims
- 1034US2023349044A1Workpiece holder, system, and operating method for pecvdCENTROTHERM INT AG·Filed 2021·Application pending·0 cites
- 1134US2018366352A1Method and device for the thermal treatment of substrates and holding unit for substratesCENTROTHERM INT AG·Filed 2016·Application pending·0 cites
- 1233US2020105516A1Method and device for forming a layer on a semiconductor substrate, and semiconductor substrateCENTROTHERM INT AG·Filed 2018·Application pending·0 cites
- 1332US2019259905A1Method For Passivating A Surface Of A Semiconductor Material And Semiconductor SubstrateCENTROTHERM INT AG·Filed 2017·Application pending·0 cites
- 1430US2018337079A1Wafer boat and plasma treatment device for wafersCENTROTHERM INT AG·Filed 2016·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →