Assignee
CLARK ROBERT D
US·15 granted patents·3 pending applications·163 citations·filing 1991–2014
Top patents by PatentIndex Score
18 records- 0197US8580664B2Method for forming ultra-shallow boron doping regions by solid phase diffusionCLARK ROBERT D·Filed 2011·Granted Nov 12, 2013·43 cites·20 claims
- 0295US8481341B2Epitaxial film growth in retrograde wells for semiconductor devicesCLARK ROBERT D·Filed 2012·Granted Jul 9, 2013·24 cites·20 claims
- 0392US8569158B2Method for forming ultra-shallow doping regions by solid phase diffusionCLARK ROBERT D·Filed 2011·Granted Oct 29, 2013·12 cites·6 claims
- 0491US8313994B2Method for forming a high-K gate stack with reduced effective oxide thicknessCLARK ROBERT D·Filed 2010·Granted Nov 20, 2012·13 cites·20 claims
- 0590US7165275B2Toilet mounting assemblyCLARK ROBERT D·Filed 2005·Granted Jan 23, 2007·14 cites·7 claims
- 0687US8962078B2Method for depositing dielectric filmsCLARK ROBERT D·Filed 2012·Granted Feb 24, 2015·3 cites·19 claims
- 0786US8877620B2Method for forming ultra-shallow doping regions by solid phase diffusionCLARK ROBERT D·Filed 2013·Granted Nov 4, 2014·6 cites·2 claims
- 0879US8440520B2Diffused cap layers for modifying high-k gate dielectrics and interface layersCLARK ROBERT D·Filed 2011·Granted May 14, 2013·5 cites·20 claims
- 0978US8865538B2Method of integrating buried threshold voltage adjustment layers for CMOS processingCLARK ROBERT D·Filed 2012·Granted Oct 21, 2014·5 cites·9 claims
- 1076US8334183B2Semiconductor device containing a buried threshold voltage adjustment layer and method of formingCLARK ROBERT D·Filed 2010·Granted Dec 18, 2012·3 cites·10 claims
- 1169US8097300B2Method of forming mixed rare earth oxynitride and aluminum oxynitride films by atomic layer depositionCLARK ROBERT D·Filed 2006·Granted Jan 17, 2012·3 cites·25 claims
- 1266US8633118B2Method of forming thin metal and semi-metal layers by thermal remote oxygen scavengingCLARK ROBERT D·Filed 2012·Granted Jan 21, 2014·1 cites·21 claims
- 1362US8119540B2Method of forming a stressed passivation film using a microwave-assisted oxidation processCLARK ROBERT D·Filed 2008·Granted Feb 21, 2012·1 cites·21 claims
- 1459US5090600ALiquid pressure opened pouring spoutCLARK ROBERT D·Filed 1991·Granted Feb 25, 1992·29 cites·8 claims
- 1557US8178446B2Strained metal nitride films and method of formingCLARK ROBERT D·Filed 2007·Granted May 15, 2012·1 cites·24 claims
- 1653US2015279691A1Method of forming thin metal and semi-metal layers by thermal remote oxygen scavengingCLARK ROBERT D·Filed 2014·Application pending·0 cites
- 1738US2012083127A1Method for forming a pattern and a semiconductor device manufacturing methodCLARK ROBERT D·Filed 2010·Application pending·0 cites
- 1838US2007143030A1Computer implemented method for aligning flexible molecules by performing ensemble alignment in the internal coordinate space followed by rigid body alignment in cartesian spaceCLARK ROBERT D·Filed 2006·Application pending·0 cites
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