Assignee

DRAEGER NERISSA

US·2 granted patents·328 citations·filing 2008–2012

Technology mixH10P2 H10W1

Top patents by PatentIndex Score

2 records

0195US8058179B1Atomic layer removal process with higher etch amountDRAEGER NERISSA·Filed 2008·Granted Nov 15, 2011·286 cites·17 claims
0294US8846536B2Flowable oxide film with tunable wet etch rateDRAEGER NERISSA·Filed 2012·Granted Sep 30, 2014·42 cites·22 claims

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