Assignee
EKC TECHNOLOGY INC
US·74 granted patents·9 pending applications·3,794 citations·filing 1981–2013
Top patents by PatentIndex Score
83 records- 0198US5334332ACleaning compositions for removing etching residue and method of usingEKC TECHNOLOGY INC·Filed 1992·Granted Aug 2, 1994·247 cites·8 claims
- 0297US5981454APost clean treatment composition comprising an organic acid and hydroxylamineEKC TECHNOLOGY INC·Filed 1997·Granted Nov 9, 1999·272 cites·8 claims
- 0397US4824763ATriamine positive photoresist stripping composition and prebaking processEKC TECHNOLOGY INC·Filed 1987·Granted Apr 25, 1989·110 cites·10 claims
- 0496US6313039B1Chemical mechanical polishing composition and processEKC TECHNOLOGY INC·Filed 2000·Granted Nov 6, 2001·125 cites·16 claims
- 0596US6117783AChemical mechanical polishing composition and processEKC TECHNOLOGY INC·Filed 1997·Granted Sep 12, 2000·240 cites·6 claims
- 0695US7543592B2Compositions and processes for photoresist stripping and residue removal in wafer level packagingEKC TECHNOLOGY INC·Filed 2005·Granted Jun 9, 2009·33 cites·19 claims
- 0795US6546939B1Post clean treatmentEKC TECHNOLOGY INC·Filed 2000·Granted Apr 15, 2003·106 cites·40 claims
- 0895US6156661APost clean treatmentEKC TECHNOLOGY INC·Filed 1999·Granted Dec 5, 2000·164 cites·12 claims
- 0995US4395348APhotoresist stripping composition and methodEKC TECHNOLOGY INC·Filed 1981·Granted Jul 26, 1983·93 cites·10 claims
- 1094US5279771AStripping compositions comprising hydroxylamine and alkanolamineEKC TECHNOLOGY INC·Filed 1990·Granted Jan 18, 1994·126 cites·9 claims
- 1193US6566276B2Method of making electronic materialsEKC TECHNOLOGY INC·Filed 2001·Granted May 20, 2003·85 cites·46 claims
- 1292US7361231B2System and method for mid-pressure dense phase gas and ultrasonic cleaningEKC TECHNOLOGY INC·Filed 2005·Granted Apr 22, 2008·36 cites·11 claims
- 1392US6916772B2Sulfoxide pyrolid(in)one alkanolamine cleaner compositionEKC TECHNOLOGY INC·Filed 2002·Granted Jul 12, 2005·58 cites·37 claims
- 1492US5482566AMethod for removing etching residue using a hydroxylamine-containing compositionEKC TECHNOLOGY INC·Filed 1994·Granted Jan 9, 1996·85 cites·11 claims
- 1591US6248704B1Compositions for cleaning organic and plasma etched residues for semiconductors devicesEKC TECHNOLOGY INC·Filed 1999·Granted Jun 19, 2001·116 cites·23 claims
- 1690US7144849B2Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2005·Granted Dec 5, 2006·11 cites·12 claims
- 1790US6235693B1Lactam compositions for cleaning organic and plasma etched residues for semiconductor devicesEKC TECHNOLOGY INC·Filed 1999·Granted May 22, 2001·111 cites·21 claims
- 1890US5911835AMethod of removing etching residueEKC TECHNOLOGY INC·Filed 1997·Granted Jun 15, 1999·102 cites·17 claims
- 1990US5672577ACleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agentEKC TECHNOLOGY INC·Filed 1995·Granted Sep 30, 1997·64 cites·8 claims
- 2090US5381807AMethod of stripping resists from substrates using hydroxylamine and alkanolamineEKC TECHNOLOGY INC·Filed 1993·Granted Jan 17, 1995·72 cites·14 claims
- 2189US7273060B2Methods for chemically treating a substrate using foam technologyEKC TECHNOLOGY INC·Filed 2006·Granted Sep 25, 2007·16 cites·30 claims
- 2289US6498131B1Composition for cleaning chemical mechanical planarization apparatusEKC TECHNOLOGY INC·Filed 2000·Granted Dec 24, 2002·56 cites·14 claims
- 2389US5399464ATriamine positive photoresist stripping composition and post-ion implantation bakingEKC TECHNOLOGY INC·Filed 1992·Granted Mar 21, 1995·69 cites·18 claims
- 2488US7718590B2Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric materialEKC TECHNOLOGY INC·Filed 2006·Granted May 18, 2010·19 cites·11 claims
- 2588US6777380B2Compositions for cleaning organic and plasma etched residues for semiconductor devicesEKC TECHNOLOGY INC·Filed 2001·Granted Aug 17, 2004·59 cites·17 claims
- 2688US6367486B1Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal processEKC TECHNOLOGY INC·Filed 2000·Granted Apr 9, 2002·42 cites·21 claims
- 2787US8003587B2Semiconductor process residue removal composition and processEKC TECHNOLOGY INC·Filed 2009·Granted Aug 23, 2011·16 cites·10 claims
- 2887US7399365B2Aqueous fluoride compositions for cleaning semiconductor devicesEKC TECHNOLOGY INC·Filed 2004·Granted Jul 15, 2008·35 cites·4 claims
- 2987US6221818B1Hydroxylamine-gallic compound composition and processEKC TECHNOLOGY INC·Filed 2000·Granted Apr 24, 2001·28 cites·5 claims
- 3086US7547669B2Remover compositions for dual damascene systemEKC TECHNOLOGY INC·Filed 2005·Granted Jun 16, 2009·10 cites·9 claims
- 3186US7419911B2Compositions and methods for rapidly removing overfilled substratesEKC TECHNOLOGY INC·Filed 2004·Granted Sep 2, 2008·37 cites·24 claims
- 3286US6825156B2Semiconductor process residue removal composition and processEKC TECHNOLOGY INC·Filed 2002·Granted Nov 30, 2004·46 cites·50 claims
- 3386US6645930B1Clean room wipes for neutralizing caustic chemicalsEKC TECHNOLOGY INC·Filed 2000·Granted Nov 11, 2003·28 cites·52 claims
- 3486US6242400B1Method of stripping resists from substrates using hydroxylamine and alkanolamineEKC TECHNOLOGY INC·Filed 2000·Granted Jun 5, 2001·34 cites·15 claims
- 3585US6696363B2Method of and apparatus for substrate pre-treatmentEKC TECHNOLOGY INC·Filed 2001·Granted Feb 24, 2004·30 cites·35 claims
- 3684US6458431B2Methods for the lithographic deposition of materials containing nanoparticlesEKC TECHNOLOGY INC·Filed 2001·Granted Oct 1, 2002·42 cites·24 claims
- 3784US6251150B1Slurry composition and method of chemical mechanical polishing using sameEKC TECHNOLOGY INC·Filed 1999·Granted Jun 26, 2001·75 cites·43 claims
- 3883US6635186B1Chemical mechanical polishing composition and processEKC TECHNOLOGY INC·Filed 1999·Granted Oct 21, 2003·45 cites·6 claims
- 3982US7528098B2Semiconductor process residue removal composition and processEKC TECHNOLOGY INC·Filed 2004·Granted May 5, 2009·30 cites·21 claims
- 4082US7387130B2Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2006·Granted Jun 17, 2008·4 cites·11 claims
- 4182US6417112B1Post etch cleaning composition and process for dual damascene systemEKC TECHNOLOGY INC·Filed 1999·Granted Jul 9, 2002·72 cites·22 claims
- 4282US6110881ACleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 1996·Granted Aug 29, 2000·61 cites·5 claims
- 4381US5902780ACleaning compositions for removing etching residue and method of usingEKC TECHNOLOGY INC·Filed 1997·Granted May 11, 1999·33 cites·6 claims
- 4480US7135445B2Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materialsEKC TECHNOLOGY INC·Filed 2003·Granted Nov 14, 2006·27 cites·27 claims
- 4580US5891205AChemical mechanical polishing compositionEKC TECHNOLOGY INC·Filed 1997·Granted Apr 6, 1999·106 cites·18 claims
- 4679US7825079B2Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixtureEKC TECHNOLOGY INC·Filed 2009·Granted Nov 2, 2010·11 cites·5 claims
- 4779US7144848B2Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removalEKC TECHNOLOGY INC·Filed 2003·Granted Dec 5, 2006·34 cites·20 claims
- 4879US7051742B2Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2004·Granted May 30, 2006·12 cites·24 claims
- 4979US6638326B2Compositions for chemical mechanical planarization of tantalum and tantalum nitrideEKC TECHNOLOGY INC·Filed 2001·Granted Oct 28, 2003·22 cites·10 claims
- 5078US6849305B2Photolytic conversion process to form patterned amorphous filmEKC TECHNOLOGY INC·Filed 2002·Granted Feb 1, 2005·29 cites·38 claims
Showing the top 50 of 83 patent records by PatentIndex Score.
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