Assignee
ELECTRON VISION CORP
US·18 granted patents·1,372 citations·filing 1988–2000
Top patents by PatentIndex Score
18 records- 0199US5003178ALarge-area uniform electron sourceELECTRON VISION CORP·Filed 1988·Granted Mar 26, 1991·259 cites·20 claims
- 0295US6407399B1Uniformity correction for large area electron sourceELECTRON VISION CORP·Filed 1999·Granted Jun 18, 2002·95 cites·17 claims
- 0393US6548899B2Method of processing films prior to chemical vapor deposition using electron beam processingELECTRON VISION CORP·Filed 2000·Granted Apr 15, 2003·132 cites·25 claims
- 0489US6358670B1Enhancement of photoresist plasma etch resistance via electron beam surface cureELECTRON VISION CORP·Filed 1999·Granted Mar 19, 2002·105 cites·28 claims
- 0589US6132814AMethod for curing spin-on-glass film utilizing electron beam radiationELECTRON VISION CORP·Filed 1997·Granted Oct 17, 2000·119 cites·30 claims
- 0687US5468595AMethod for three-dimensional control of solubility properties of resist layersELECTRON VISION CORP·Filed 1994·Granted Nov 21, 1995·100 cites·24 claims
- 0786US6255035B1Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devicesELECTRON VISION CORP·Filed 1999·Granted Jul 3, 2001·84 cites·21 claims
- 0886US6207555B1Electron beam process during dual damascene processingELECTRON VISION CORP·Filed 1999·Granted Mar 27, 2001·70 cites·38 claims
- 0986US6204201B1Method of processing films prior to chemical vapor deposition using electron beam processingELECTRON VISION CORP·Filed 1999·Granted Mar 20, 2001·75 cites·23 claims
- 1083US6340556B1Tailoring of linewidth through electron beam post exposureELECTRON VISION CORP·Filed 2000·Granted Jan 22, 2002·28 cites·27 claims
- 1182US6271146B1Electron beam treatment of fluorinated silicate glassELECTRON VISION CORP·Filed 1999·Granted Aug 7, 2001·61 cites·23 claims
- 1278US6607991B1Method for curing spin-on dielectric films utilizing electron beam radiationELECTRON VISION CORP·Filed 1999·Granted Aug 19, 2003·63 cites·16 claims
- 1378US6489225B1Method for controlling dopant profiles and dopant activation by electron beam processingELECTRON VISION CORP·Filed 2000·Granted Dec 3, 2002·20 cites·23 claims
- 1477US6319655B1Modification of 193 nm sensitive photoresist materials by electron beam exposureELECTRON VISION CORP·Filed 1999·Granted Nov 20, 2001·67 cites·28 claims
- 1576US6426127B1Electron beam modification of perhydrosilazane spin-on glassELECTRON VISION CORP·Filed 1999·Granted Jul 30, 2002·37 cites·36 claims
- 1663US6195246B1Electrostatic chuck having replaceable dielectric coverELECTRON VISION CORP·Filed 1999·Granted Feb 27, 2001·29 cites·28 claims
- 1756US6551926B1Electron beam annealing of metals, alloys, nitrides and silicidesELECTRON VISION CORP·Filed 2000·Granted Apr 22, 2003·7 cites·16 claims
- 1855US6218090B1Method of creating controlled discontinuity between photoresist and substrate for improving metal lift offELECTRON VISION CORP·Filed 1999·Granted Apr 17, 2001·21 cites·27 claims
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