Assignee
FOCUS EBEAM TECH BEIJING CO LTD
CN·12 granted patents·21 citations·filing 2017–2022
Top patents by PatentIndex Score
12 records- 0195US10777382B2Low voltage scanning electron microscope and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2018·Granted Sep 15, 2020·14 cites·21 claims
- 0288US11145487B2Scanning electron microscope with composite detection system and specimen detection methodFOCUS EBEAM TECH BEIJING CO LTD·Filed 2019·Granted Oct 12, 2021·3 cites·16 claims
- 0386US11075056B2Scanning electron microscope objective lens system and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2018·Granted Jul 27, 2021·3 cites·16 claims
- 0483US11798781B2MicroscopeFOCUS EBEAM TECH BEIJING CO LTD·Filed 2020·Granted Oct 24, 2023·1 cites·7 claims
- 0565US12224153B2Electron microscopeFOCUS EBEAM TECH BEIJING CO LTD·Filed 2021·Granted Feb 11, 2025·0 cites·10 claims
- 0658US12315694B2Electron beam systemFOCUS EBEAM TECH BEIJING CO LTD·Filed 2022·Granted May 27, 2025·0 cites·7 claims
- 0758US11508548B2Scanning electron microscopeFOCUS EBEAM TECH BEIJING CO LTD·Filed 2020·Granted Nov 22, 2022·0 cites·9 claims
- 0851US11598732B2Imaging system and method for specimen detectionFOCUS EBEAM TECH BEIJING CO LTD·Filed 2018·Granted Mar 7, 2023·0 cites·12 claims
- 0949US10879036B2Charged particle beam system, opto-electro simultaneous detection system and methodFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Dec 29, 2020·0 cites·18 claims
- 1045US10699874B2Vacuum condition controlling apparatus, system and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Jun 30, 2020·0 cites·19 claims
- 1144US10903039B2Vacuum condition processing apparatus, system and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Jan 26, 2021·0 cites·18 claims
- 1241US10923312B2Magnetic lens and exciting current control methodFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Feb 16, 2021·0 cites·6 claims
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →