Assignee
FUJIFILM ELECTRONIC MATERIALS
US·17 granted patents·5 pending applications·132 citations·filing 2003–2013
Top patents by PatentIndex Score
22 records- 0193US7803510B2Positive photosensitive polybenzoxazole precursor compositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted Sep 28, 2010·27 cites·65 claims
- 0292US7947637B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MATERIALS·Filed 2007·Granted May 24, 2011·21 cites·34 claims
- 0390US8709277B2Etching compositionFUJIFILM ELECTRONIC MATERIALS·Filed 2013·Granted Apr 29, 2014·10 cites·39 claims
- 0490US7531590B2Additives to prevent degradation of alkyl-hydrogen siloxanesFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted May 12, 2009·23 cites·23 claims
- 0587US7985350B2Additives to prevent degradation of cyclic alkene derivativesFUJIFILM ELECTRONIC MATERIALS·Filed 2010·Granted Jul 26, 2011·4 cites·43 claims
- 0683US7871536B2Additives to prevent degradation of cyclic alkene derivativesFUJIFILM ELECTRONIC MATERIALS·Filed 2009·Granted Jan 18, 2011·4 cites·36 claims
- 0783US7407731B2Photosensitive resin compositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted Aug 5, 2008·9 cites·26 claims
- 0882US7220520B2Photosensitive resin compositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted May 22, 2007·8 cites·18 claims
- 0972US7931823B2Additives to prevent degradation of cyclic alkene derivativesFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted Apr 26, 2011·2 cites·54 claims
- 1066US7399572B2Pretreatment compositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted Jul 15, 2008·2 cites·12 claims
- 1163US7883639B2Additives to prevent degradation of cyclic alkene derivativesFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Granted Feb 8, 2011·2 cites·40 claims
- 1263US7416830B2Photosensitive resin compositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2004·Granted Aug 26, 2008·7 cites·46 claims
- 1362US7727705B2High etch resistant underlayer compositions for multilayer lithographic processesFUJIFILM ELECTRONIC MATERIALS·Filed 2008·Granted Jun 1, 2010·2 cites·18 claims
- 1461US7935665B2Non-corrosive cleaning compositions for removing etch residuesFUJIFILM ELECTRONIC MATERIALS·Filed 2003·Granted May 3, 2011·8 cites·26 claims
- 1558US7402552B2Non-corrosive cleaning composition for removing plasma etching residuesFUJIFILM ELECTRONIC MATERIALS·Filed 2005·Granted Jul 22, 2008·0 cites·11 claims
- 1649US7416821B2Thermally cured undercoat for lithographic applicationFUJIFILM ELECTRONIC MATERIALS·Filed 2005·Granted Aug 26, 2008·3 cites·24 claims
- 1747US9200372B2Passivation composition and processFUJIFILM ELECTRONIC MATERIALS·Filed 2012·Granted Dec 1, 2015·0 cites·25 claims
- 1846US2009004444A1Novel Photosensitive Resin CompositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2008·Application pending·0 cites
- 1945US2008199805A1Photosensitive compositions employing silicon-containing additivesFUJIFILM ELECTRONIC MATERIALS·Filed 2008·Application pending·0 cites
- 2044US2008199814A1Device manufacturing process utilizing a double patterning processFUJIFILM ELECTRONIC MATERIALS·Filed 2007·Application pending·0 cites
- 2140US2006172231A1Use of an oxidizer to improve trace metals removal from photoresist and photoresist componentsFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Application pending·0 cites
- 2239US2006240358A1Pretreatment compositionsFUJIFILM ELECTRONIC MATERIALS·Filed 2006·Application pending·0 cites
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