Assignee
FUJIMOTO MASASHI
JP·2 granted patents·0 citations·filing 2010–2012
Technology mixG03F2
Top patents by PatentIndex Score
2 records- 0153US8617797B2Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patternsFUJIMOTO MASASHI·Filed 2012·Granted Dec 31, 2013·0 cites·6 claims
- 0249US8192919B2Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patternsFUJIMOTO MASASHI·Filed 2010·Granted Jun 5, 2012·0 cites·20 claims
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