Assignee
GLOBAL WAFERS CO LTD
TW·8 granted patents·3 pending applications·10 citations·filing 2015–2018
Top patents by PatentIndex Score
11 records- 0187US10793969B2Sample rod growth and resistivity measurement during single crystal silicon ingot productionGLOBAL WAFERS CO LTD·Filed 2018·Granted Oct 6, 2020·2 cites·18 claims
- 0286US10954606B2Methods for modeling the impurity concentration of a single crystal silicon ingotGLOBAL WAFERS CO LTD·Filed 2018·Granted Mar 23, 2021·2 cites·17 claims
- 0383US10781532B2Methods for determining the resistivity of a polycrystalline silicon meltGLOBAL WAFERS CO LTD·Filed 2018·Granted Sep 22, 2020·1 cites·19 claims
- 0482US10211297B2Semiconductor heterostructures and methods for forming sameGLOBAL WAFERS CO LTD·Filed 2017·Granted Feb 19, 2019·4 cites·21 claims
- 0573US10811307B2Polishing slurries for polishing semiconductor wafersGLOBAL WAFERS CO LTD·Filed 2018·Granted Oct 20, 2020·1 cites·18 claims
- 0651US11047066B2Growth of plural sample rods to determine impurity build-up during production of single crystal silicon ingotsGLOBAL WAFERS CO LTD·Filed 2018·Granted Jun 29, 2021·0 cites·15 claims
- 0742US2020002840A1Systems for producing a monocrystalline ingot that involve monitoring neck growth moving averageGLOBAL WAFERS CO LTD·Filed 2018·Application pending·0 cites
- 0842US2020002839A1Monitoring a moving average of the ingot neck pull rate to control the quality of the neck for ingot growthGLOBAL WAFERS CO LTD·Filed 2018·Application pending·0 cites
- 0942US2020002838A1Methods for producing a silicon ingot that involve monitoring a moving average of the ingot neck pull rateGLOBAL WAFERS CO LTD·Filed 2018·Application pending·0 cites
- 1039US9633843B2Silicon substrates with compressive stress and methods for production of the sameGLOBAL WAFERS CO LTD·Filed 2016·Granted Apr 25, 2017·0 cites·19 claims
- 1139US9378946B2Silicon substrates with compressive stress and methods for production of the sameGLOBAL WAFERS CO LTD·Filed 2015·Granted Jun 28, 2016·0 cites·19 claims
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →