Assignee

HENAFF LOUIS

FR·1 granted patent·44 citations·filing 1982–1982

Technology mixB01J1 C23C1 C30B1 H01J1 H10P1

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0171US4434742AInstallation for depositing thin layers in the reactive vapor phaseHENAFF LOUIS·Filed 1982·Granted Mar 6, 1984·44 cites·3 claims

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