Assignee
HIRANO TOMOYUKI
JP·11 granted patents·2 pending applications·31 citations·filing 2007–2012
Top patents by PatentIndex Score
13 records- 0191US8394578B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Mar 12, 2013·9 cites·3 claims
- 0290US8329378B2Positive resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted Dec 11, 2012·9 cites·12 claims
- 0387US8440385B2Positive resist composition, method of forming resist pattern and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted May 14, 2013·5 cites·16 claims
- 0478US8866251B2Solid-state imaging element having optical waveguide with insulating layerHIRANO TOMOYUKI·Filed 2009·Granted Oct 21, 2014·4 cites·8 claims
- 0573US8980524B2Positive resist composition and method of forming resist patternHIRANO TOMOYUKI·Filed 2010·Granted Mar 17, 2015·2 cites·10 claims
- 0673US8632960B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Jan 21, 2014·2 cites·12 claims
- 0747US8911928B2Resist composition, method of forming resist pattern, polymeric compound and method of producing the sameHIRANO TOMOYUKI·Filed 2012·Granted Dec 16, 2014·0 cites·6 claims
- 0846US2008105920A1Semiconductor devices and fabrication process thereofHIRANO TOMOYUKI·Filed 2007·Application pending·0 cites
- 0945US9250531B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2012·Granted Feb 2, 2016·0 cites·20 claims
- 1043US8586288B2Method of forming resist patternHIRANO TOMOYUKI·Filed 2012·Granted Nov 19, 2013·0 cites·6 claims
- 1142US8450044B2Positive resist composition and method of forming resist patternHIRANO TOMOYUKI·Filed 2010·Granted May 28, 2013·0 cites·5 claims
- 1241US8735045B2Positive resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted May 27, 2014·0 cites·10 claims
- 1339US2012100487A1Resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2011·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →