Individual holder
HORSKY THOMAS N
US·5 granted patents·6 pending applications·20 citations·filing 2004–2011
Individually held — no corporate assignee on record.
Top patents by PatentIndex Score
11 records- 0191US8071958B2Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsHORSKY THOMAS N·Filed 2008·Granted Dec 6, 2011·11 cites·6 claims
- 0288US8618514B2Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsHORSKY THOMAS N·Filed 2011·Granted Dec 31, 2013·5 cites·6 claims
- 0382US8410459B2Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsHORSKY THOMAS N·Filed 2011·Granted Apr 2, 2013·3 cites·2 claims
- 0466US8330118B2Multi mode ion sourceHORSKY THOMAS N·Filed 2009·Granted Dec 11, 2012·1 cites·23 claims
- 0555US2008223409A1Method and apparatus for extending equipment uptime in ion implantationHORSKY THOMAS N·Filed 2008·Application pending·0 cites
- 0651US2006272776A1Method and apparatus for extracting ions from an ion source for use in ion implantationHORSKY THOMAS N·Filed 2006·Application pending·0 cites
- 0749US2007278417A1Ion implantation ion source, system and methodHORSKY THOMAS N·Filed 2007·Application pending·0 cites
- 0848US2012064705A1VaporizerHORSKY THOMAS N·Filed 2011·Application pending·0 cites
- 0945US2008305598A1Ion implantation device and a method of semiconductor manufacturing by the implantation of ions derived from carborane molecular speciesHORSKY THOMAS N·Filed 2007·Application pending·0 cites
- 1040US2008073559A1Controlling the flow of vapors sublimated from solidsHORSKY THOMAS N·Filed 2004·Application pending·0 cites
- 1138US8586459B2Ion implantation with molecular ions containing phosphorus and arsenicHORSKY THOMAS N·Filed 2007·Granted Nov 19, 2013·0 cites·35 claims
Join the waitlist — get patent alerts
Get an alert when HORSKY THOMAS N files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →