Assignee
HUDSON ERIC
US·10 granted patents·2 pending applications·206 citations·filing 2006–2017
Top patents by PatentIndex Score
12 records- 0198US8540844B2Plasma confinement structures in plasma processing systemsHUDSON ERIC·Filed 2009·Granted Sep 24, 2013·167 cites·19 claims
- 0295US9655353B1Multi-section fishing deviceHUDSON ERIC·Filed 2016·Granted May 23, 2017·9 cites·15 claims
- 0389US8158017B2Detection of arcing events in wafer plasma processing through monitoring of trace gas concentrationsHUDSON ERIC·Filed 2008·Granted Apr 17, 2012·10 cites·13 claims
- 0486US10149463B2Multi-section fishing deviceHUDSON ERIC·Filed 2017·Granted Dec 11, 2018·3 cites·10 claims
- 0583US8478548B2User interface system and method for diagnosing a rotating machine condition not based upon prior measurement historyHUDSON ERIC·Filed 2010·Granted Jul 2, 2013·8 cites·20 claims
- 0682US8677590B2Plasma confinement structures in plasma processing systems and methods thereofHUDSON ERIC·Filed 2013·Granted Mar 25, 2014·4 cites·20 claims
- 0780US8956461B2Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber partsHUDSON ERIC·Filed 2010·Granted Feb 17, 2015·4 cites·9 claims
- 0868US8518209B2Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing systemHUDSON ERIC·Filed 2009·Granted Aug 27, 2013·1 cites·17 claims
- 0955US9177762B2System, method and apparatus of a wedge-shaped parallel plate plasma reactor for substrate processingHUDSON ERIC·Filed 2011·Granted Nov 3, 2015·0 cites·14 claims
- 1054US2009065148A1Methods and apparatus for igniting a low pressure plasmaHUDSON ERIC·Filed 2008·Application pending·0 cites
- 1153US2012175060A1Detection of arcing events in wafer plasma processing through monitoring of trace gas concentrationsHUDSON ERIC·Filed 2012·Application pending·0 cites
- 1250US8635971B2Tunable uniformity in a plasma processing systemHUDSON ERIC·Filed 2006·Granted Jan 28, 2014·0 cites·19 claims
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →