Assignee
IKUTA YOSHIAKI
JP·2 granted patents·14 citations·filing 2002–2011
Top patents by PatentIndex Score
2 records- 0193US8241821B2Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithographyIKUTA YOSHIAKI·Filed 2011·Granted Aug 14, 2012·14 cites·24 claims
- 0238US8402786B2Synthetic silica glass optical component and process for its productionIKUTA YOSHIAKI·Filed 2002·Granted Mar 26, 2013·0 cites·7 claims
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