Assignee
INST OF APPLIED PHYSICS RAS
RU·1 granted patent·1 pending application·2 citations·filing 2003–2008
Top patents by PatentIndex Score
2 records- 0151US2009123663A1High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said methodINST OF APPLIED PHYSICS RAS·Filed 2008·Application pending·0 cites
- 0243US7694651B2High velocity method for deposing diamond films from a gaseous phase in SHF discharge plasma and device for carrying out said methodINST OF APPLIED PHYSICS RAS·Filed 2003·Granted Apr 13, 2010·2 cites·3 claims
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