Assignee
INVARIUM INC
US·11 granted patents·347 citations·filing 2004–2005
Top patents by PatentIndex Score
11 records- 0195US7318214B1System and method for reducing patterning variability in integrated circuit manufacturing through mask layout correctionsINVARIUM INC·Filed 2004·Granted Jan 8, 2008·149 cites·36 claims
- 0294US7444615B2Calibration on wafer sweet spotsINVARIUM INC·Filed 2005·Granted Oct 28, 2008·25 cites·25 claims
- 0394US7266800B2Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processesINVARIUM INC·Filed 2004·Granted Sep 4, 2007·94 cites·49 claims
- 0490US7392502B2Method for real time monitoring and verifying optical proximity correction model and methodINVARIUM INC·Filed 2005·Granted Jun 24, 2008·16 cites·20 claims
- 0582US7379170B2Apparatus and method for characterizing an image system in lithography projection toolINVARIUM INC·Filed 2005·Granted May 27, 2008·6 cites·31 claims
- 0678US7224437B2Method for measuring and verifying stepper illuminationINVARIUM INC·Filed 2005·Granted May 29, 2007·5 cites·28 claims
- 0771US7277165B2Method of characterizing flareINVARIUM INC·Filed 2004·Granted Oct 2, 2007·11 cites·42 claims
- 0871US7246343B2Method for correcting position-dependent distortions in patterning of integrated circuitsINVARIUM INC·Filed 2004·Granted Jul 17, 2007·10 cites·37 claims
- 0969US7401319B2Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout designINVARIUM INC·Filed 2004·Granted Jul 15, 2008·17 cites·58 claims
- 1068US7275225B2Correcting design data for manufactureINVARIUM INC·Filed 2004·Granted Sep 25, 2007·14 cites·67 claims
- 1141US7189481B2Characterizing flare of a projection lensINVARIUM INC·Filed 2004·Granted Mar 13, 2007·0 cites·44 claims
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