Assignee
JX ADVANCED METALS CORP
JP·10 granted patents·14 pending applications·0 citations·filing 2018–2025
Top patents by PatentIndex Score
24 records- 0186US12241153B2Sputtering target and manufacturing method thereforJX ADVANCED METALS CORP·Filed 2023·Granted Mar 4, 2025·0 cites·10 claims
- 0286US2026001774A1High-purity molybdenum oxychloride and manufacturing method thereforJX ADVANCED METALS CORP·Filed 2025·Application pending·0 cites
- 0379US12198911B2Nonmagnetic material-dispersed Fe-Pt based sputtering targetJX ADVANCED METALS CORP·Filed 2022·Granted Jan 14, 2025·0 cites·9 claims
- 0475US2025361599A1Tungsten silicide target and method for manufacturing same, and method for manufacturing tungsten silicide filmJX ADVANCED METALS CORP·Filed 2025·Application pending·0 cites
- 0568US2026058193A1Sulfide-based solid electrolyte and all-solid-state lithium ion batteryJX ADVANCED METALS CORP·Filed 2023·Application pending·0 cites
- 0665US12312674B2Sputtering targetJX ADVANCED METALS CORP·Filed 2022·Granted May 27, 2025·0 cites·8 claims
- 0764US12132289B2Copper electrode materialJX ADVANCED METALS CORP·Filed 2020·Granted Oct 29, 2024·0 cites·5 claims
- 0864US2025043382A1Metal leaching methodJX ADVANCED METALS CORP·Filed 2022·Application pending·0 cites
- 0962US12297121B2Stannous oxide powder and method for producing sameJX ADVANCED METALS CORP·Filed 2018·Granted May 13, 2025·0 cites·17 claims
- 1062US12234544B2Sputtering target and method for producing sputtering targetJX ADVANCED METALS CORP·Filed 2022·Granted Feb 25, 2025·0 cites·16 claims
- 1162US2025313943A1Sputtering Target, Method for Manufacturing Laminated Film, Laminated Film, and Magnetic Recording MediumJX ADVANCED METALS CORP·Filed 2023·Application pending·0 cites
- 1261US2025318095A1Metal Resin Composite Electromagnetic Shielding MaterialJX ADVANCED METALS CORP·Filed 2023·Application pending·0 cites
- 1360US2024417845A1Sputtering Target And Method For Manufacturing The SameJX ADVANCED METALS CORP·Filed 2022·Application pending·0 cites
- 1460US2025075308A1Oxide film and oxide sputtering targetJX ADVANCED METALS CORP·Filed 2022·Application pending·0 cites
- 1559US2025129451A1Copper alloys for electronic materials and electronic componentsJX ADVANCED METALS CORP·Filed 2023·Application pending·0 cites
- 1659US2025043384A1Metal leaching methodJX ADVANCED METALS CORP·Filed 2022·Application pending·0 cites
- 1756US2025185225A1Electromagnetic Wave Shielding Material, Covering Material or Exterior Material, and Electric/Electronic ApparatusJX ADVANCED METALS CORP·Filed 2022·Application pending·0 cites
- 1854US12162040B2Processing method and processing device for electronic/electrical device component scrapJX ADVANCED METALS CORP·Filed 2020·Granted Dec 10, 2024·0 cites·9 claims
- 1954US2025261354A1Electromagnetic Wave Shielding Material, Covering Material or Exterior Material, and Electric/Electronic ApparatusJX ADVANCED METALS CORP·Filed 2023·Application pending·0 cites
- 2052US12217967B2Indium phosphide substrateJX ADVANCED METALS CORP·Filed 2020·Granted Feb 4, 2025·0 cites·11 claims
- 2152US2026075786A1Electromagnetic Wave Shielding Material, Covering Material or Exterior Material, and Electric/Electronic ApparatusJX ADVANCED METALS CORP·Filed 2023·Application pending·0 cites
- 2251US12090518B2Method for processing electronic and electric device component scrapsJX ADVANCED METALS CORP·Filed 2020·Granted Sep 17, 2024·0 cites·10 claims
- 2350US12312655B2Method for processing electronic and electrical device component scrapJX ADVANCED METALS CORP·Filed 2019·Granted May 27, 2025·0 cites·8 claims
- 2444US2025154677A1Easily crushable electrodeposited copperJX ADVANCED METALS CORP·Filed 2022·Application pending·0 cites
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