Assignee
KAMIMURA TETSUYA
JP·9 granted patents·1 pending application·21 citations·filing 2008–2012
Top patents by PatentIndex Score
10 records- 0187US8419970B2Silicon nitride polishing liquid and polishing methodKAMIMURA TETSUYA·Filed 2009·Granted Apr 16, 2013·12 cites·10 claims
- 0277US8932479B2Polishing liquid and polishing methodKAMIMURA TETSUYA·Filed 2011·Granted Jan 13, 2015·4 cites·22 claims
- 0368US8715524B2Polishing liquidKAMIMURA TETSUYA·Filed 2008·Granted May 6, 2014·3 cites·19 claims
- 0465US9070636B2Cleaning agent for semiconductor substrate, cleaning method using the cleaning agent, and method for producing semiconductor elementKAMIMURA TETSUYA·Filed 2011·Granted Jun 30, 2015·1 cites·7 claims
- 0563US8911643B2Polishing liquid and polishing methodKAMIMURA TETSUYA·Filed 2009·Granted Dec 16, 2014·1 cites·4 claims
- 0656US8338303B2Polishing liquidKAMIMURA TETSUYA·Filed 2009·Granted Dec 25, 2012·0 cites·16 claims
- 0749US2012252214A1Polishing liquid and polishing methodKAMIMURA TETSUYA·Filed 2012·Application pending·0 cites
- 0848US8551928B2Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor elementKAMIMURA TETSUYA·Filed 2011·Granted Oct 8, 2013·0 cites·13 claims
- 0944US9688912B2Etching method, and etching liquid to be used therein and method of producing a semiconductor substrate product using the sameKAMIMURA TETSUYA·Filed 2012·Granted Jun 27, 2017·0 cites·12 claims
- 1042US9048195B2Polishing fluid and polishing methodKAMIMURA TETSUYA·Filed 2011·Granted Jun 2, 2015·0 cites·15 claims
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