Assignee
KAWAGUCHI MARK NAOSHI
US·2 granted patents·1 pending application·16 citations·filing 2008–2009
Top patents by PatentIndex Score
3 records- 0183US9735002B2Integrated apparatus for efficient removal of halogen residues from etched substratesKAWAGUCHI MARK NAOSHI·Filed 2008·Granted Aug 15, 2017·12 cites·16 claims
- 0271US9159593B2Method of particle contaminant removalKAWAGUCHI MARK NAOSHI·Filed 2009·Granted Oct 13, 2015·4 cites·18 claims
- 0346US2010258142A1Apparatus and method for using a viscoelastic cleaning material to remove particles on a substrateKAWAGUCHI MARK NAOSHI·Filed 2009·Application pending·0 cites
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