Assignee
KAWAI HIDEMI
US·5 granted patents·25 citations·filing 2007–2009
Top patents by PatentIndex Score
5 records- 0192US8269946B2Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquidKAWAI HIDEMI·Filed 2009·Granted Sep 18, 2012·8 cites·27 claims
- 0288US8493545B2Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery portKAWAI HIDEMI·Filed 2009·Granted Jul 23, 2013·5 cites·41 claims
- 0385US8670104B2Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of objectKAWAI HIDEMI·Filed 2009·Granted Mar 11, 2014·4 cites·11 claims
- 0485US8670103B2Cleanup method for optics in immersion lithography using bubblesKAWAI HIDEMI·Filed 2007·Granted Mar 11, 2014·4 cites·22 claims
- 0585US8085381B2Cleanup method for optics in immersion lithography using sonic deviceKAWAI HIDEMI·Filed 2007·Granted Dec 27, 2011·4 cites·17 claims
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