Assignee

KISHIMOTO KEISUKE

JP·3 granted patents·1 pending application·8 citations·filing 2008–2011

Technology mixB41J4

Top patents by PatentIndex Score

4 records

0183US8287747B2Method of processing silicon substrate and method of manufacturing substrate for liquid discharge headKISHIMOTO KEISUKE·Filed 2010·Granted Oct 16, 2012·4 cites·6 claims
0265US8197705B2Method of processing silicon substrate and method of manufacturing liquid discharge headKISHIMOTO KEISUKE·Filed 2008·Granted Jun 12, 2012·2 cites·13 claims
0364US8597529B2Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection headKISHIMOTO KEISUKE·Filed 2009·Granted Dec 3, 2013·2 cites·14 claims
0435US2012088317A1Processing method of silicon substrate and process for producing liquid ejection headKISHIMOTO KEISUKE·Filed 2011·Application pending·0 cites

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