Assignee
KLA TENCOR CORP
US·1,518 granted patents·75 pending applications·21,663 citations·filing 1995–2022
Top patents by PatentIndex Score
1,593 records- 0199US8929406B2193NM laser and inspection systemKLA TENCOR CORP·Filed 2014·Granted Jan 6, 2015·63 cites·26 claims
- 0299US6462818B1Overlay alignment mark designKLA TENCOR CORP·Filed 2000·Granted Oct 8, 2002·192 cites·32 claims
- 0399US6433541B1In-situ metalization monitoring using eddy current measurements during the process for removing the filmKLA TENCOR CORP·Filed 2000·Granted Aug 13, 2002·161 cites·21 claims
- 0499US6201601B1Sample inspection systemKLA TENCOR CORP·Filed 1997·Granted Mar 13, 2001·359 cites·51 claims
- 0598US10748730B2Photocathode including field emitter array on a silicon substrate with boron layerKLA TENCOR CORP·Filed 2016·Granted Aug 18, 2020·16 cites·27 claims
- 0698US10527951B2Compound imaging metrology targetsKLA TENCOR CORP·Filed 2016·Granted Jan 7, 2020·18 cites·21 claims
- 0798US10352695B2X-ray scatterometry metrology for high aspect ratio structuresKLA TENCOR CORP·Filed 2016·Granted Jul 16, 2019·68 cites·21 claims
- 0898US10324050B2Measurement system optimization for X-ray based metrologyKLA TENCOR CORP·Filed 2016·Granted Jun 18, 2019·32 cites·20 claims
- 0998US10228320B1Achieving a small pattern placement error in metrology targetsKLA—TENCOR CORP·Filed 2015·Granted Mar 12, 2019·17 cites·17 claims
- 1098US10043261B2Generating simulated output for a specimenKLA TENCOR CORP·Filed 2017·Granted Aug 7, 2018·32 cites·28 claims
- 1198US9518916B1Compressive sensing for metrologyKLA TENCOR CORP·Filed 2014·Granted Dec 13, 2016·38 cites·29 claims
- 1298US9470639B1Optical metrology with reduced sensitivity to grating anomaliesKLA TENCOR CORP·Filed 2016·Granted Oct 18, 2016·31 cites·20 claims
- 1398US7933026B2High resolution monitoring of CD variationsKLA TENCOR CORP·Filed 2009·Granted Apr 26, 2011·178 cites·7 claims
- 1498US7929667B1High brightness X-ray metrologyKLA TENCOR CORP·Filed 2009·Granted Apr 19, 2011·191 cites·18 claims
- 1598US7897942B1Dynamic tracking of wafer motion and distortion during lithographyKLA TENCOR CORP·Filed 2008·Granted Mar 1, 2011·56 cites·28 claims
- 1698US7826071B2Parametric profiling using optical spectroscopic systemsKLA TENCOR CORP·Filed 2007·Granted Nov 2, 2010·114 cites·24 claims
- 1798US7478019B2Multiple tool and structure analysisKLA TENCOR CORP·Filed 2005·Granted Jan 13, 2009·225 cites·30 claims
- 1898US6886153B1Design driven inspection or measurement for semiconductor using recipeKLA TENCOR CORP·Filed 2001·Granted Apr 26, 2005·135 cites·23 claims
- 1998US6707540B1In-situ metalization monitoring using eddy current and optical measurementsKLA TENCOR CORP·Filed 2000·Granted Mar 16, 2004·162 cites·38 claims
- 2098US6611330B2System for measuring polarimetric spectrum and other properties of a sampleKLA TENCOR CORP·Filed 2001·Granted Aug 26, 2003·120 cites·249 claims
- 2198US6081325AOptical scanning system for surface inspectionKLA TENCOR CORP·Filed 1997·Granted Jun 27, 2000·279 cites·67 claims
- 2298US5883710AScanning system for inspecting anomalies on surfacesKLA TENCOR CORP·Filed 1995·Granted Mar 16, 1999·209 cites·46 claims
- 2397US11248905B2Machine learning in metrology measurementsKLA TENCOR CORP·Filed 2017·Granted Feb 15, 2022·8 cites·20 claims
- 2497US10895541B2Systems and methods for combined x-ray reflectometry and photoelectron spectroscopyKLA TENCOR CORP·Filed 2018·Granted Jan 19, 2021·21 cites·20 claims
- 2597US10775323B2Full beam metrology for X-ray scatterometry systemsKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·19 cites·21 claims
- 2697US10727142B2Process monitoring of deep structures with X-ray scatterometryKLA TENCOR CORP·Filed 2018·Granted Jul 28, 2020·17 cites·13 claims
- 2797US10197389B2Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fieldsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·19 cites·23 claims
- 2897US10101676B2Spectroscopic beam profile overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Oct 16, 2018·15 cites·20 claims
- 2997US10095122B1Systems and methods for fabricating metrology targets with sub-resolution featuresKLA TENCOR CORP·Filed 2016·Granted Oct 9, 2018·18 cites·18 claims
- 3097US10072921B2Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive elementKLA TENCOR CORP·Filed 2015·Granted Sep 11, 2018·17 cites·19 claims
- 3197US10013518B2Model building and analysis engine for combined X-ray and optical metrologyKLA TENCOR CORP·Filed 2013·Granted Jul 3, 2018·29 cites·20 claims
- 3297US9885962B2Methods and apparatus for measuring semiconductor device overlay using X-ray metrologyKLA TENCOR CORP·Filed 2014·Granted Feb 6, 2018·35 cites·22 claims
- 3397US9874526B2Methods and apparatus for polarized wafer inspectionKLA TENCOR CORP·Filed 2017·Granted Jan 23, 2018·17 cites·22 claims
- 3497US9826614B1Compac X-ray source for semiconductor metrologyKLA TENCOR CORP·Filed 2014·Granted Nov 21, 2017·22 cites·20 claims
- 3597US9818887B2Back-illuminated sensor with boron layerKLA TENCOR CORP·Filed 2016·Granted Nov 14, 2017·11 cites·15 claims
- 3697US9784690B2Apparatus, techniques, and target designs for measuring semiconductor parametersKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·14 cites·20 claims
- 3797US9778213B2Metrology tool with combined XRF and SAXS capabilitiesKLA TENCOR CORP·Filed 2014·Granted Oct 3, 2017·39 cites·20 claims
- 3897US9660409B2Low noise, high stability, deep ultra-violet, continuous wave laserKLA TENCOR CORP·Filed 2016·Granted May 23, 2017·11 cites·11 claims
- 3997US9529182B2193nm laser and inspection systemKLA TENCOR CORP·Filed 2014·Granted Dec 27, 2016·33 cites·3 claims
- 4097US9494535B2Scatterometry-based imaging and critical dimension metrologyKLA TENCOR CORP·Filed 2015·Granted Nov 15, 2016·23 cites·25 claims
- 4197US9496425B2Back-illuminated sensor with boron layerKLA TENCOR CORP·Filed 2013·Granted Nov 15, 2016·29 cites·26 claims
- 4297US9476698B2Periodic patterns and technique to control misalignment between two layersKLA TENCOR CORP·Filed 2015·Granted Oct 25, 2016·22 cites·13 claims
- 4397US9478402B2Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensorKLA TENCOR CORP·Filed 2014·Granted Oct 25, 2016·20 cites·10 claims
- 4497US9461435B2Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon populationKLA TENCOR CORP·Filed 2015·Granted Oct 4, 2016·13 cites·11 claims
- 4597US9347879B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR CORP·Filed 2015·Granted May 24, 2016·17 cites·21 claims
- 4697US9222895B2Generalized virtual inspectorKLA TENCOR CORP·Filed 2014·Granted Dec 29, 2015·96 cites·43 claims
- 4797US9182219B1Overlay measurement based on moire effect between structured illumination and overlay targetKLA TENCOR CORP·Filed 2014·Granted Nov 10, 2015·23 cites·20 claims
- 4897US9151940B2Semiconductor inspection and metrology system using laser pulse multiplierKLA TENCOR CORP·Filed 2012·Granted Oct 6, 2015·32 cites·16 claims
- 4997US9092846B2Detecting defects on a wafer using defect-specific and multi-channel informationKLA TENCOR CORP·Filed 2014·Granted Jul 28, 2015·30 cites·56 claims
- 5097US8675188B2Method and system for determining one or more optical characteristics of structure of a semiconductor waferKLA TENCOR CORP·Filed 2013·Granted Mar 18, 2014·33 cites·29 claims
Showing the top 50 of 1,593 patent records by PatentIndex Score.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →