Assignee
KOSHIMIZU CHISHIO
JP·15 granted patents·2 pending applications·103 citations·filing 2008–2012
Top patents by PatentIndex Score
17 records- 0197US8298371B2Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2008·Granted Oct 30, 2012·26 cites·5 claims
- 0294US8894806B2Plasma processing apparatus and plasma processing methodKOSHIMIZU CHISHIO·Filed 2010·Granted Nov 25, 2014·22 cites·10 claims
- 0391US8741095B2Plasma processing apparatus, plasma processing method, and computer readable storage mediumKOSHIMIZU CHISHIO·Filed 2009·Granted Jun 3, 2014·16 cites·9 claims
- 0490US8293068B2Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2009·Granted Oct 23, 2012·17 cites·12 claims
- 0578US8825434B2Temperature measuring method, storage medium, and programKOSHIMIZU CHISHIO·Filed 2011·Granted Sep 2, 2014·4 cites·7 claims
- 0678US8426317B2Plasma processing apparatus and plasma processing methodKOSHIMIZU CHISHIO·Filed 2010·Granted Apr 23, 2013·4 cites·14 claims
- 0778US8164033B2Stage, substrate processing apparatus, plasma processing apparatus, control method for stage, control method for plasma processing apparatus, and storage mediaKOSHIMIZU CHISHIO·Filed 2011·Granted Apr 24, 2012·3 cites·4 claims
- 0872US8689733B2Plasma processorKOSHIMIZU CHISHIO·Filed 2008·Granted Apr 8, 2014·2 cites·19 claims
- 0972US8486221B2Focus ring heating method, plasma etching apparatus, and plasma etching methodKOSHIMIZU CHISHIO·Filed 2010·Granted Jul 16, 2013·2 cites·42 claims
- 1071US8425791B2In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including sameKOSHIMIZU CHISHIO·Filed 2009·Granted Apr 23, 2013·2 cites·4 claims
- 1170US8178444B2Substrate processing method and substrate processing apparatusKOSHIMIZU CHISHIO·Filed 2009·Granted May 15, 2012·3 cites·13 claims
- 1264US8829387B2Plasma processing apparatus having hollow electrode on periphery and plasma control methodKOSHIMIZU CHISHIO·Filed 2011·Granted Sep 9, 2014·1 cites·15 claims
- 1361US9136097B2Shower plate and substrate processing apparatusKOSHIMIZU CHISHIO·Filed 2008·Granted Sep 15, 2015·1 cites·14 claims
- 1453US2012145186A1Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2012·Application pending·0 cites
- 1552US8404137B2Plasma processing apparatus and plasma processing methodKOSHIMIZU CHISHIO·Filed 2011·Granted Mar 26, 2013·0 cites·4 claims
- 1642US9207689B2Substrate temperature control method and plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2012·Granted Dec 8, 2015·0 cites·8 claims
- 1741US2012031560A1Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2011·Application pending·0 cites
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