Assignee

LAUFER TIMO

DE·1 granted patent·1 citations·filing 2012–2012

Technology mixF21V1 G02B1 G03F1 H10P1

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0156US9134504B2Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatusLAUFER TIMO·Filed 2012·Granted Sep 15, 2015·1 cites·23 claims

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