Assignee
LEE SANG IN
US·17 granted patents·11 pending applications·2,447 citations·filing 2003–2012
Top patents by PatentIndex Score
28 records- 0199US9163310B2Enhanced deposition of layer on substrate using radicalsLEE SANG IN·Filed 2012·Granted Oct 20, 2015·338 cites·19 claims
- 0299US8895108B2Method for forming thin film using radicals generated by plasmaLEE SANG IN·Filed 2012·Granted Nov 25, 2014·344 cites·20 claims
- 0399US8877300B2Atomic layer deposition using radicals of gas mixtureLEE SANG IN·Filed 2012·Granted Nov 4, 2014·338 cites·9 claims
- 0499US8758512B2Vapor deposition reactor and method for forming thin filmLEE SANG IN·Filed 2010·Granted Jun 24, 2014·347 cites·18 claims
- 0599US8697198B2Magnetic field assisted depositionLEE SANG IN·Filed 2012·Granted Apr 15, 2014·337 cites·8 claims
- 0699US8470718B2Vapor deposition reactor for forming thin filmLEE SANG IN·Filed 2009·Granted Jun 25, 2013·345 cites·14 claims
- 0797US8257799B2Method for forming thin film using radicals generated by plasmaLEE SANG IN·Filed 2010·Granted Sep 4, 2012·21 cites·18 claims
- 0896US8771791B2Deposition of layer using depositing apparatus with reciprocating susceptorLEE SANG IN·Filed 2011·Granted Jul 8, 2014·338 cites·8 claims
- 0992US8617652B2Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strengthLEE SANG IN·Filed 2012·Granted Dec 31, 2013·4 cites·11 claims
- 1089US8722526B2Growing of gallium-nitrade layer on silicon substrateLEE SANG IN·Filed 2012·Granted May 13, 2014·9 cites·22 claims
- 1187US8851012B2Vapor deposition reactor using plasma and method for forming thin film using the sameLEE SANG IN·Filed 2009·Granted Oct 7, 2014·6 cites·14 claims
- 1287US8263502B2Forming substrate structure by filling recesses with deposition materialLEE SANG IN·Filed 2009·Granted Sep 11, 2012·9 cites·53 claims
- 1386US8840958B2Combined injection module for sequentially injecting source precursor and reactant precursorLEE SANG IN·Filed 2012·Granted Sep 23, 2014·3 cites·11 claims
- 1481US9129913B2Formation of barrier layer on device using atomic layer depositionLEE SANG IN·Filed 2011·Granted Sep 8, 2015·6 cites·8 claims
- 1571US8770142B2Electrode for generating plasma and plasma generatorLEE SANG IN·Filed 2009·Granted Jul 8, 2014·2 cites·6 claims
- 1670US2010291281A1Diet food using pork skinLEE SANG IN·Filed 2009·Application pending·0 cites
- 1753US8501633B2Forming substrate structure by filling recesses with deposition materialLEE SANG IN·Filed 2012·Granted Aug 6, 2013·0 cites·13 claims
- 1852US2012213947A1Depositing thin layer of material on permeable substrateLEE SANG IN·Filed 2012·Application pending·0 cites
- 1951US2012114877A1Radical Reactor with Multiple Plasma ChambersLEE SANG IN·Filed 2011·Application pending·0 cites
- 2051US2012125258A1Extended Reactor Assembly with Multiple Sections for Performing Atomic Layer Deposition on Large SubstrateLEE SANG IN·Filed 2011·Application pending·0 cites
- 2150US2012027953A1Rotating Reactor Assembly for Depositing Film on SubstrateLEE SANG IN·Filed 2011·Application pending·0 cites
- 2250US2013174980A1High strength bonding and coating mixture and methodLEE SANG IN·Filed 2012·Application pending·0 cites
- 2347US2011117514A1Silicon Firnaceware for Stressed FilmLEE SANG IN·Filed 2009·Application pending·0 cites
- 2443US2011290551A1Protective structure enclosing device on flexible substrateLEE SANG IN·Filed 2011·Application pending·0 cites
- 2542US8871628B2Electrode structure, device comprising the same and method for forming electrode structureLEE SANG IN·Filed 2010·Granted Oct 28, 2014·0 cites·11 claims
- 2642US2012021252A1Treating Surface of Substrate Using Inert Gas Plasma in Atomic Layer DepositionLEE SANG IN·Filed 2011·Application pending·0 cites
- 2736US2006228888A1Atomic layer deposition of high k metal silicatesLEE SANG-IN·Filed 2003·Application pending·0 cites
- 2836US2006258078A1Atomic layer deposition of high-k metal oxidesLEE SANG-IN·Filed 2003·Application pending·0 cites
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