Assignee
LEE WONCHUL
US·4 granted patents·44 citations·filing 2008–2012
Top patents by PatentIndex Score
4 records- 0192US8609546B2Pulsed bias plasma process to control microloadingLEE WONCHUL·Filed 2008·Granted Dec 17, 2013·24 cites·21 claims
- 0289US8969936B2Semiconductor devices having increased contact areas between contacts and active regions and methods of fabricating the sameLEE WONCHUL·Filed 2012·Granted Mar 3, 2015·14 cites·34 claims
- 0377US8518282B2Method of controlling etch microloading for a tungsten-containing layerLEE WONCHUL·Filed 2008·Granted Aug 27, 2013·5 cites·20 claims
- 0463US8802571B2Method of hard mask CD control by Ar sputteringLEE WONCHUL·Filed 2011·Granted Aug 12, 2014·1 cites·19 claims
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