Assignee
LEEPL CORP
JP·5 granted patents·32 citations·filing 2000–2002
Top patents by PatentIndex Score
5 records- 0175US6624430B2Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatusLEEPL CORP·Filed 2002·Granted Sep 23, 2003·12 cites·7 claims
- 0265US6727507B2Electron beam proximity exposure apparatus and methodLEEPL CORP·Filed 2001·Granted Apr 27, 2004·7 cites·5 claims
- 0361US6894295B2Electron beam proximity exposure apparatus and mask unit thereforLEEPL CORP·Filed 2000·Granted May 17, 2005·5 cites·7 claims
- 0461US6717157B2Mask inspecting apparatusLEEPL CORP·Filed 2002·Granted Apr 6, 2004·5 cites·12 claims
- 0550US6703623B1Electron beam proximity exposure apparatusLEEPL CORP·Filed 2000·Granted Mar 9, 2004·3 cites·29 claims
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