Assignee
LEYBOLD MATERIALS GMBH
DE·7 granted patents·89 citations·filing 1994–1997
Top patents by PatentIndex Score
7 records- 0160US5480532ASputter target for cathodic atomization to produce transparent, conductive layersLEYBOLD MATERIALS GMBH·Filed 1994·Granted Jan 2, 1996·21 cites·5 claims
- 0251US6039855ATarget for the sputtering cathode of a vacuum coating apparatus and method for its manufactureLEYBOLD MATERIALS GMBH·Filed 1996·Granted Mar 21, 2000·18 cites·5 claims
- 0347US5728279ACobalt base alloy target for a magnetron cathode sputtering systemLEYBOLD MATERIALS GMBH·Filed 1994·Granted Mar 17, 1998·14 cites·6 claims
- 0441US6372104B1Cobalt base alloy sputtering target with high magnetic field penetrationLEYBOLD MATERIALS GMBH·Filed 1995·Granted Apr 16, 2002·11 cites·4 claims
- 0541US5531948AProcess for the production of partially reduced indium oxide-tin oxide targetsLEYBOLD MATERIALS GMBH·Filed 1995·Granted Jul 2, 1996·9 cites·5 claims
- 0639US5660599AProcess for the recycling of spent indium oxide-tin oxide sputtering targetsLEYBOLD MATERIALS GMBH·Filed 1995·Granted Aug 26, 1997·9 cites·4 claims
- 0735US6187253B1Method of preparing indium oxide/tin oxide target for cathodic sputteringLEYBOLD MATERIALS GMBH·Filed 1997·Granted Feb 13, 2001·7 cites·1 claims
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