Assignee
LOYACK ADAM
US·2 granted patents·38 citations·filing 2010–2010
Top patents by PatentIndex Score
2 records- 0191US8257545B2Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewithLOYACK ADAM·Filed 2010·Granted Sep 4, 2012·38 cites·10 claims
- 0236US8697217B2Creep-resistant polishing pad windowLOYACK ADAM·Filed 2010·Granted Apr 15, 2014·0 cites·7 claims
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