Assignee
MASUNAGA KEIICHI
JP·12 granted patents·75 citations·filing 2010–2012
Top patents by PatentIndex Score
12 records- 0196US8470511B2Chemically amplified negative resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·16 cites·17 claims
- 0295US8426108B2Chemically amplified positive resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Apr 23, 2013·13 cites·5 claims
- 0394US8288076B2Chemically amplified resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2010·Granted Oct 16, 2012·12 cites·15 claims
- 0492US9244348B2Chemically amplified negative resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2012·Granted Jan 26, 2016·8 cites·5 claims
- 0592US8470512B2Polymer, chemically amplified negative resist composition, and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·10 cites·10 claims
- 0691US8632939B2Polymer, chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Jan 21, 2014·8 cites·12 claims
- 0787US8815491B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2012·Granted Aug 26, 2014·5 cites·4 claims
- 0874US8273830B2Deprotection method of protected polymerMASUNAGA KEIICHI·Filed 2010·Granted Sep 25, 2012·2 cites·7 claims
- 0967US8835096B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2012·Granted Sep 16, 2014·1 cites·4 claims
- 1045US8685629B2Resist pattern forming processMASUNAGA KEIICHI·Filed 2012·Granted Apr 1, 2014·0 cites·8 claims
- 1139US8859181B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Oct 14, 2014·0 cites·10 claims
- 1239US8546060B2Chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Oct 1, 2013·0 cites·5 claims
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