Assignee
MINAMI HISATAKA
JP·4 granted patents·7 citations·filing 2009–2012
Top patents by PatentIndex Score
4 records- 0173US9447306B2CMP polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base materialMINAMI HISATAKA·Filed 2012·Granted Sep 20, 2016·3 cites·17 claims
- 0266US9799532B2CMP polishing solution and polishing methodMINAMI HISATAKA·Filed 2011·Granted Oct 24, 2017·2 cites·22 claims
- 0363US10796921B2CMP fluid and method for polishing palladiumMINAMI HISATAKA·Filed 2010·Granted Oct 6, 2020·2 cites·18 claims
- 0443US8900473B2Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMPMINAMI HISATAKA·Filed 2009·Granted Dec 2, 2014·0 cites·9 claims
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