Assignee
NAGAI SATOSHI
JP·2 granted patents·5 pending applications·1 citations·filing 2009–2011
Top patents by PatentIndex Score
7 records- 0159US8142960B2Exposure method, mask data producing method, and semiconductor device manufacturing methodNAGAI SATOSHI·Filed 2009·Granted Mar 27, 2012·1 cites·7 claims
- 0252US8658630B2Allergen depressant and depression methodNAGAI SATOSHI·Filed 2010·Granted Feb 25, 2014·0 cites·15 claims
- 0347US2010225890A1Method for evaluating flare in exposure toolNAGAI SATOSHI·Filed 2009·Application pending·0 cites
- 0445US2010028789A1Method of controlling exposure device, method of fabricating semiconductor, and photomaskNAGAI SATOSHI·Filed 2009·Application pending·0 cites
- 0544US2009258319A1Exposure method and semiconductor device manufacturing methodNAGAI SATOSHI·Filed 2009·Application pending·0 cites
- 0636US2013090877A1Lithography tool alignment control systemNAGAI SATOSHI·Filed 2011·Application pending·0 cites
- 0735US2012244461A1Overlay control method and a semiconductor manufacturing method and apparatus employing the sameNAGAI SATOSHI·Filed 2011·Application pending·0 cites
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