Assignee
NIKON CORP
JP·7,380 granted patents·2,039 pending applications·151,680 citations·filing 1985–2025
Top patents by PatentIndex Score
9,419 records- 0199US11774864B2Carrier device, exposure apparatus, exposure method, manufacturing method of flat-panel display, device manufacturing method, and carrying methodNIKON CORP·Filed 2021·Granted Oct 3, 2023·6 cites·34 claims
- 0299US7732744B2Image input apparatus, photodetection apparatus, and image synthesis methodNIKON CORP·Filed 2006·Granted Jun 8, 2010·104 cites·9 claims
- 0399US7639343B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2007·Granted Dec 29, 2009·111 cites·46 claims
- 0499US7589821B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2007·Granted Sep 15, 2009·115 cites·11 claims
- 0599US7545479B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2007·Granted Jun 9, 2009·58 cites·4 claims
- 0699US7535550B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2007·Granted May 19, 2009·53 cites·18 claims
- 0799US7522259B2Cleanup method for optics in immersion lithographyNIKON CORP·Filed 2005·Granted Apr 21, 2009·71 cites·38 claims
- 0899US7489389B2Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional planeNIKON CORP·Filed 2005·Granted Feb 10, 2009·566 cites·17 claims
- 0999US7486385B2Exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2006·Granted Feb 3, 2009·96 cites·26 claims
- 1099US7483119B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2005·Granted Jan 27, 2009·76 cites·102 claims
- 1199US7460207B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2005·Granted Dec 2, 2008·87 cites·54 claims
- 1299US7456930B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Nov 25, 2008·51 cites·54 claims
- 1399US7446851B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2006·Granted Nov 4, 2008·104 cites·29 claims
- 1499US7436486B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2006·Granted Oct 14, 2008·123 cites·14 claims
- 1599US7388649B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2005·Granted Jun 17, 2008·121 cites·50 claims
- 1699US7379158B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2006·Granted May 27, 2008·85 cites·49 claims
- 1799US7372538B2Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2005·Granted May 13, 2008·107 cites·106 claims
- 1899US7355676B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2006·Granted Apr 8, 2008·51 cites·29 claims
- 1999US7327435B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2005·Granted Feb 5, 2008·75 cites·19 claims
- 2099US7321419B2Exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2005·Granted Jan 22, 2008·112 cites·7 claims
- 2199US7321415B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2005·Granted Jan 22, 2008·63 cites·85 claims
- 2299US7268854B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2005·Granted Sep 11, 2007·61 cites·29 claims
- 2399US7251017B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2005·Granted Jul 31, 2007·65 cites·37 claims
- 2499US7023610B2Ultraviolet laser apparatus and exposure apparatus using sameNIKON CORP·Filed 2003·Granted Apr 4, 2006·495 cites·89 claims
- 2599US6897963B1Stage device and exposure apparatusNIKON CORP·Filed 2000·Granted May 24, 2005·481 cites·20 claims
- 2699US6795169B2Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatusNIKON CORP·Filed 2003·Granted Sep 21, 2004·481 cites·21 claims
- 2799US6710857B2Substrate holding apparatus and exposure apparatus including substrate holding apparatusNIKON CORP·Filed 2001·Granted Mar 23, 2004·505 cites·28 claims
- 2899US6683433B2Exposure apparatus and method utilizing isolated reaction frameNIKON CORP·Filed 2001·Granted Jan 27, 2004·133 cites·33 claims
- 2999US6633364B2Exposure apparatus, exposure method, and device manufacturing methodNIKON CORP·Filed 2001·Granted Oct 14, 2003·577 cites·36 claims
- 3099US6633365B2Projection optical system and exposure apparatus having the projection optical systemNIKON CORP·Filed 2001·Granted Oct 14, 2003·471 cites·11 claims
- 3199US6608681B2Exposure method and apparatusNIKON CORP·Filed 2002·Granted Aug 19, 2003·171 cites·19 claims
- 3299US6600547B2Sliding sealNIKON CORP·Filed 2001·Granted Jul 29, 2003·713 cites·28 claims
- 3399US6590634B1Exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jul 8, 2003·843 cites·50 claims
- 3499US6549269B1Exposure apparatus and an exposure methodNIKON CORP·Filed 2000·Granted Apr 15, 2003·601 cites·56 claims
- 3599US6445093B1Planar motor with linear coil arraysNIKON CORP·Filed 2000·Granted Sep 3, 2002·202 cites·27 claims
- 3699US6437463B1Wafer positioner with planar motor and mag-lev fine stageNIKON CORP·Filed 2000·Granted Aug 20, 2002·135 cites·89 claims
- 3799US6400441B1Projection exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jun 4, 2002·707 cites·36 claims
- 3899US6341007B1Exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jan 22, 2002·1k cites·25 claims
- 3999US6044231ACamera with dual mode exposure controlled data imprintingNIKON CORP·Filed 1994·Granted Mar 28, 2000·209 cites·17 claims
- 4099US5874820AWindow frame-guided stage mechanismNIKON CORP·Filed 1995·Granted Feb 23, 1999·760 cites·15 claims
- 4199US5810463AIllumination deviceNIKON CORP·Filed 1995·Granted Sep 22, 1998·240 cites·10 claims
- 4299US5646413AExposure apparatus and method which synchronously moves the mask and the substrate to measure displacementNIKON CORP·Filed 1996·Granted Jul 8, 1997·504 cites·34 claims
- 4399US5493403AMethod and apparatus for the alignment of a substrateNIKON CORP·Filed 1995·Granted Feb 20, 1996·285 cites·15 claims
- 4499US5448332AExposure method and apparatusNIKON CORP·Filed 1994·Granted Sep 5, 1995·705 cites·38 claims
- 4599US5243195AProjection exposure apparatus having an off-axis alignment system and method of alignment thereforNIKON CORP·Filed 1992·Granted Sep 7, 1993·821 cites·11 claims
- 4699US5194893AExposure method and projection exposure apparatusNIKON CORP·Filed 1992·Granted Mar 16, 1993·302 cites·5 claims
- 4799US5086314AExposure control apparatus for cameraNIKON CORP·Filed 1991·Granted Feb 4, 1992·182 cites·69 claims
- 4898US11567419B2Control method of movable body, exposure method, device manufacturing method, movable body apparatus, and exposure apparatusNIKON CORP·Filed 2021·Granted Jan 31, 2023·3 cites·20 claims
- 4998US10338482B2Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing methodNIKON CORP·Filed 2018·Granted Jul 2, 2019·10 cites·35 claims
- 5098USD829260SDigital cameraNIKON CORP·Filed 2017·Granted Sep 25, 2018·64 cites·1 claims
Showing the top 50 of 9,419 patent records by PatentIndex Score.
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