Assignee
NISHIZUKA TETSUYA
JP·4 granted patents·1 pending application·47 citations·filing 2007–2012
Top patents by PatentIndex Score
5 records- 0194US8809199B2Method of etching features in silicon nitride filmsNISHIZUKA TETSUYA·Filed 2011·Granted Aug 19, 2014·44 cites·19 claims
- 0270US8753527B2Plasma etching method and plasma etching apparatusNISHIZUKA TETSUYA·Filed 2009·Granted Jun 17, 2014·3 cites·11 claims
- 0356US8765589B2Semiconductor device manufacturing methodNISHIZUKA TETSUYA·Filed 2008·Granted Jul 1, 2014·0 cites·7 claims
- 0443US8298955B2Plasma etching methodNISHIZUKA TETSUYA·Filed 2007·Granted Oct 30, 2012·0 cites·5 claims
- 0537US2013344702A1Method of etching silicon nitride filmsNISHIZUKA TETSUYA·Filed 2012·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when NISHIZUKA TETSUYA files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →