Assignee
NOVA MEASURING INSTR INC
US·28 granted patents·10 pending applications·36 citations·filing 2016–2025
Top patents by PatentIndex Score
38 records- 0195US10119925B2Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)NOVA MEASURING INSTR INC·Filed 2017·Granted Nov 6, 2018·7 cites·25 claims
- 0292US10481112B2Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)NOVA MEASURING INSTR INC·Filed 2018·Granted Nov 19, 2019·4 cites·20 claims
- 0391US11029148B2Feed-forward of multi-layer and multi-process information using XPS and XRF technologiesNOVA MEASURING INSTR INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 0491US10859519B2Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS)NOVA MEASURING INSTR INC·Filed 2019·Granted Dec 8, 2020·3 cites·25 claims
- 0591US10533961B2Method and system for non-destructive metrology of thin layersNOVA MEASURING INSTR INC·Filed 2016·Granted Jan 14, 2020·5 cites·18 claims
- 0691US10056242B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2016·Granted Aug 21, 2018·5 cites·13 claims
- 0790US11996259B2Patterned x-ray emitting targetNOVA MEASURING INSTR INC·Filed 2020·Granted May 28, 2024·2 cites·16 claims
- 0890US2026079122A1System and method for measuring a sample by x-ray reflectance scatterometryNOVA MEASURING INSTR INC·Filed 2025·Application pending·0 cites
- 0989US11183377B2Mass spectrometer detector and system and method using the sameNOVA MEASURING INSTR INC·Filed 2017·Granted Nov 23, 2021·6 cites·19 claims
- 1089US10648802B2Feed-forward of multi-layer and multi-process information using XPS and XRF technologiesNOVA MEASURING INSTR INC·Filed 2019·Granted May 12, 2020·2 cites·20 claims
- 1188US12360063B2System and method for measuring a sample by x-ray reflectance scatterometryNOVA MEASURING INSTR INC·Filed 2024·Granted Jul 15, 2025·0 cites·20 claims
- 1288US2025052704A1Method and system for non-destructive metrology of thin layersNOVA MEASURING INSTR INC·Filed 2024·Application pending·0 cites
- 1386US12165863B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2023·Granted Dec 10, 2024·0 cites·18 claims
- 1485US12066391B2Method and system for non-destructive metrology of thin layersNOVA MEASURING INSTR INC·Filed 2023·Granted Aug 20, 2024·0 cites·20 claims
- 1583US12158437B2XPS metrology for process control in selective depositionNOVA MEASURING INSTR INC·Filed 2023·Granted Dec 3, 2024·0 cites·12 claims
- 1682US11764050B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2022·Granted Sep 19, 2023·0 cites·20 claims
- 1781US2024085174A1Feed-forward of multi-layer and multi-process information using xps and xrf technologiesNOVA MEASURING INSTR INC·Filed 2023·Application pending·0 cites
- 1878US11680915B2XPS metrology for process control in selective depositionNOVA MEASURING INSTR INC·Filed 2022·Granted Jun 20, 2023·0 cites·19 claims
- 1977US12281893B2Characterizing and measuring in small boxes using XPS with multiple measurementsNOVA MEASURING INSTR INC·Filed 2024·Granted Apr 22, 2025·0 cites·20 claims
- 2076US11430647B2Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass SpectrometryNOVA MEASURING INSTR INC·Filed 2021·Granted Aug 30, 2022·0 cites·21 claims
- 2173US11733035B2Feed-forward of multi-layer and multi-process information using XPS and XRF technologiesNOVA MEASURING INSTR INC·Filed 2021·Granted Aug 22, 2023·0 cites·7 claims
- 2273US10910208B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2020·Granted Feb 2, 2021·0 cites·20 claims
- 2372US11874237B2System and method for measuring a sample by x-ray reflectance scatterometryNOVA MEASURING INSTR INC·Filed 2020·Granted Jan 16, 2024·0 cites·19 claims
- 2472US11823883B2Mass spectrometer detector and system and method using the sameNOVA MEASURING INSTR INC·Filed 2021·Granted Nov 21, 2023·0 cites·7 claims
- 2572US11668663B2Method and system for non-destructive metrology of thin layersNOVA MEASURING INSTR INC·Filed 2020·Granted Jun 6, 2023·0 cites·10 claims
- 2671US11988502B2Characterizing and measuring in small boxes using XPS with multiple measurementsNOVA MEASURING INSTR INC·Filed 2022·Granted May 21, 2024·0 cites·17 claims
- 2771US11346795B2XPS metrology for process control in selective depositionNOVA MEASURING INSTR INC·Filed 2020·Granted May 31, 2022·0 cites·20 claims
- 2871US2025314487A1Characterizing and measuring in small boxes using xps with multiple measurementsNOVA MEASURING INSTR INC·Filed 2025·Application pending·0 cites
- 2969US10636644B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2019·Granted Apr 28, 2020·0 cites·7 claims
- 3069US2019033069A1Feed-forward of multi-layer and multi-process information using xps and xrf technologiesNOVA MEASURING INSTR INC·Filed 2018·Application pending·0 cites
- 3167US2024167814A1Method and system for monitoring deposition processNOVA MEASURING INSTR INC·Filed 2023·Application pending·0 cites
- 3266US10403489B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2018·Granted Sep 3, 2019·0 cites·22 claims
- 3365US2026098824A1A high brightness primary x-ray source for in-line xps and xrf metrologyNOVA MEASURING INSTR INC·Filed 2023·Application pending·0 cites
- 3464US10801978B2XPS metrology for process control in selective depositionNOVA MEASURING INSTR INC·Filed 2019·Granted Oct 13, 2020·0 cites·22 claims
- 3563US2025006451A1Patterned x-ray emitting targetNOVA MEASURING INSTR INC·Filed 2024·Application pending·0 cites
- 3659US2025067691A1Production solutions for high-throughput/precision xps metrology using unsupervised machine learningNOVA MEASURING INSTR INC·Filed 2022·Application pending·0 cites
- 3758US2026029359A1Adaptive count rate modulation to increase depth profile dynamic range in secondary ion mass spectroscopyNOVA MEASURING INSTR INC·Filed 2022·Application pending·0 cites
- 3853US11852467B2Method and system for monitoring deposition processNOVA MEASURING INSTR INC·Filed 2020·Granted Dec 26, 2023·0 cites·18 claims
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