Assignee
NOVELLUS SYSTEMS INC
US·770 granted patents·63 pending applications·55,673 citations·filing 1990–2024
Top patents by PatentIndex Score
833 records- 0199US11732350B2Films of desired composition and film propertiesNOVELLUS SYSTEMS INC·Filed 2022·Granted Aug 22, 2023·6 cites·20 claims
- 0299US11708634B2Films of desired composition and film propertiesNOVELLUS SYSTEMS INC·Filed 2022·Granted Jul 25, 2023·5 cites·27 claims
- 0399US11680314B2Films of desired composition and film propertiesNOVELLUS SYSTEMS INC·Filed 2022·Granted Jun 20, 2023·6 cites·29 claims
- 0499US11680315B2Films of desired composition and film propertiesNOVELLUS SYSTEMS INC·Filed 2022·Granted Jun 20, 2023·6 cites·30 claims
- 0599US9786570B2Methods for depositing films on sensitive substratesNOVELLUS SYSTEMS INC·Filed 2016·Granted Oct 10, 2017·362 cites·6 claims
- 0699US9472432B1Dedicated hot and cold end effectors for improved throughputNOVELLUS SYSTEMS INC·Filed 2013·Granted Oct 18, 2016·337 cites·19 claims
- 0799US9390909B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2014·Granted Jul 12, 2016·500 cites·18 claims
- 0899US7915139B1CVD flowable gap fillNOVELLUS SYSTEMS INC·Filed 2009·Granted Mar 29, 2011·807 cites·25 claims
- 0999US7888233B1Flowable film dielectric gap fill processNOVELLUS SYSTEMS INC·Filed 2009·Granted Feb 15, 2011·572 cites·30 claims
- 1099US7582555B1CVD flowable gap fillNOVELLUS SYSTEMS INC·Filed 2005·Granted Sep 1, 2009·605 cites·20 claims
- 1199US7524735B1Flowable film dielectric gap fill processNOVELLUS SYSTEMS INC·Filed 2006·Granted Apr 28, 2009·166 cites·19 claims
- 1299US7514375B1Pulsed bias having high pulse frequency for filling gaps with dielectric materialNOVELLUS SYSTEMS INC·Filed 2006·Granted Apr 7, 2009·559 cites·27 claims
- 1399US7186648B1Barrier first method for single damascene trench applicationsNOVELLUS SYSTEMS INC·Filed 2004·Granted Mar 6, 2007·553 cites·23 claims
- 1499US7074690B1Selective gap-fill processNOVELLUS SYSTEMS INC·Filed 2004·Granted Jul 11, 2006·471 cites·37 claims
- 1599US6878402B2Method and apparatus for improved temperature control in atomic layer depositionNOVELLUS SYSTEMS INC·Filed 2001·Granted Apr 12, 2005·499 cites·19 claims
- 1699US6527920B1Copper electroplating apparatusNOVELLUS SYSTEMS INC·Filed 2000·Granted Mar 4, 2003·251 cites·36 claims
- 1799US6030881AHigh throughput chemical vapor deposition process capable of filling high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 1998·Granted Feb 29, 2000·575 cites·34 claims
- 1898US10103058B2Tungsten feature fillNOVELLUS SYSTEMS INC·Filed 2017·Granted Oct 16, 2018·23 cites·13 claims
- 1998US10043655B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2017·Granted Aug 7, 2018·28 cites·20 claims
- 2098US10008428B2Methods for depositing films on sensitive substratesNOVELLUS SYSTEMS INC·Filed 2017·Granted Jun 26, 2018·27 cites·13 claims
- 2198US9834852B2Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplatingNOVELLUS SYSTEMS INC·Filed 2016·Granted Dec 5, 2017·13 cites·20 claims
- 2298US9653353B2Tungsten feature fillNOVELLUS SYSTEMS INC·Filed 2013·Granted May 16, 2017·50 cites·16 claims
- 2398US9570274B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2015·Granted Feb 14, 2017·30 cites·11 claims
- 2498US9464361B2Control of electrolyte hydrodynamics for efficient mass transfer during electroplatingNOVELLUS SYSTEMS INC·Filed 2014·Granted Oct 11, 2016·12 cites·15 claims
- 2598US9449795B2Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactorNOVELLUS SYSTEMS INC·Filed 2013·Granted Sep 20, 2016·398 cites·22 claims
- 2698US9399228B2Method and apparatus for purging and plasma suppression in a process chamberNOVELLUS SYSTEMS INC·Filed 2013·Granted Jul 26, 2016·428 cites·8 claims
- 2798US9287113B2Methods for depositing films on sensitive substratesNOVELLUS SYSTEMS INC·Filed 2013·Granted Mar 15, 2016·74 cites·19 claims
- 2898US9240347B2Tungsten feature fillNOVELLUS SYSTEMS INC·Filed 2014·Granted Jan 19, 2016·72 cites·20 claims
- 2998US9234276B2Method to obtain SiC class of films of desired composition and film propertiesNOVELLUS SYSTEMS INC·Filed 2013·Granted Jan 12, 2016·42 cites·15 claims
- 3098US9070555B2Method for depositing a chlorine-free conformal sin filmNOVELLUS SYSTEMS INC·Filed 2013·Granted Jun 30, 2015·31 cites·19 claims
- 3198US8809161B2Flowable film dielectric gap fill processNOVELLUS SYSTEMS INC·Filed 2013·Granted Aug 19, 2014·21 cites·27 claims
- 3298US8043972B1Adsorption based material removal processNOVELLUS SYSTEMS INC·Filed 2008·Granted Oct 25, 2011·537 cites·29 claims
- 3398US7955972B2Methods for growing low-resistivity tungsten for high aspect ratio and small featuresNOVELLUS SYSTEMS INC·Filed 2008·Granted Jun 7, 2011·87 cites·22 claims
- 3498US7935940B1Measuring in-situ UV intensity in UV cure toolNOVELLUS SYSTEMS INC·Filed 2008·Granted May 3, 2011·577 cites·19 claims
- 3598US7906174B1PECVD methods for producing ultra low-k dielectric films using UV treatmentNOVELLUS SYSTEMS INC·Filed 2006·Granted Mar 15, 2011·507 cites·23 claims
- 3698US7897215B1Sequential UV induced chemical vapor depositionNOVELLUS SYSTEMS INC·Filed 2003·Granted Mar 1, 2011·524 cites·20 claims
- 3798US7851232B2UV treatment for carbon-containing low-k dielectric repair in semiconductor processingNOVELLUS SYSTEMS INC·Filed 2006·Granted Dec 14, 2010·571 cites·22 claims
- 3898US7790633B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2006·Granted Sep 7, 2010·643 cites·23 claims
- 3998US7727880B1Protective self-aligned buffer layers for damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2007·Granted Jun 1, 2010·332 cites·19 claims
- 4098US7691749B2Deposition of tungsten nitrideNOVELLUS SYSTEMS INC·Filed 2005·Granted Apr 6, 2010·97 cites·18 claims
- 4198US7682498B1Rotationally asymmetric variable electrode correctionNOVELLUS SYSTEMS INC·Filed 2005·Granted Mar 23, 2010·39 cites·41 claims
- 4298US7655567B1Methods for improving uniformity and resistivity of thin tungsten filmsNOVELLUS SYSTEMS INC·Filed 2007·Granted Feb 2, 2010·91 cites·14 claims
- 4398US7648899B1Interfacial layers for electromigration resistance improvement in damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2008·Granted Jan 19, 2010·78 cites·27 claims
- 4498US7629227B1CVD flowable gap fillNOVELLUS SYSTEMS INC·Filed 2007·Granted Dec 8, 2009·78 cites·23 claims
- 4598US7625820B1Method of selective coverage of high aspect ratio structures with a conformal filmNOVELLUS SYSTEMS INC·Filed 2006·Granted Dec 1, 2009·530 cites·9 claims
- 4698US7622024B1High resistance ionic current sourceNOVELLUS SYSTEMS INC·Filed 2005·Granted Nov 24, 2009·83 cites·28 claims
- 4798US7589028B1Hydroxyl bond removal and film densification method for oxide films using microwave post treatmentNOVELLUS SYSTEMS INC·Filed 2005·Granted Sep 15, 2009·424 cites·25 claims
- 4898US7589017B2Methods for growing low-resistivity tungsten filmNOVELLUS SYSTEMS INC·Filed 2005·Granted Sep 15, 2009·103 cites·21 claims
- 4998US7491308B2Method of making rolling electrical contact to wafer front surfaceNOVELLUS SYSTEMS INC·Filed 2005·Granted Feb 17, 2009·18 cites·19 claims
- 5098US7482247B1Conformal nanolaminate dielectric deposition and etch bag gap fill processNOVELLUS SYSTEMS INC·Filed 2006·Granted Jan 27, 2009·583 cites·27 claims
Showing the top 50 of 833 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when NOVELLUS SYSTEMS INC files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →