Assignee
OGAWA YOSHIHIRO
JP·4 granted patents·4 pending applications·8 citations·filing 2005–2011
Top patents by PatentIndex Score
8 records- 0177US8435903B2Semiconductor substrate surface treatment methodOGAWA YOSHIHIRO·Filed 2011·Granted May 7, 2013·4 cites·20 claims
- 0268US8399357B2Method of manufacturing semiconductor deviceOGAWA YOSHIHIRO·Filed 2011·Granted Mar 19, 2013·2 cites·20 claims
- 0361US8183761B2Light emitting apparatusOGAWA YOSHIHIRO·Filed 2008·Granted May 22, 2012·2 cites·2 claims
- 0447US2011143541A1Apparatus and method of treating surface of semiconductor substrateOGAWA YOSHIHIRO·Filed 2010·Application pending·0 cites
- 0546US8758521B2Apparatus and method for cleaning semiconductor substrateOGAWA YOSHIHIRO·Filed 2010·Granted Jun 24, 2014·0 cites·8 claims
- 0644US2008064212A1Method of manufacturing semiconductor deviceOGAWA YOSHIHIRO·Filed 2007·Application pending·0 cites
- 0741US2006134923A1Semiconductor substrate cleaning apparatus and methodOGAWA YOSHIHIRO·Filed 2005·Application pending·0 cites
- 0836US2010243003A1Apparatus and method for cleaning semiconductor substrateOGAWA YOSHIHIRO·Filed 2010·Application pending·0 cites
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