Assignee
OKADA TOSHIYUKI
SG·1 granted patent·8 pending applications·2 citations·filing 2009–2012
Top patents by PatentIndex Score
9 records- 0170US2009324528A1Hair conditioning composition containing a salt of stearyl amidopropyl dimethylamine, and having higher yield pointOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0270US2010143425A1Method for Preparing Personal Care Composition Comprising Surfactant and High Melting Point Fatty CompoundOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0370US2010143281A1Method for Preparing Personal Care Composition Comprising Surfactant and High Melting Point Fatty CompoundOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0470US2009324531A1Hair conditioning composition containing behenyl trimethyl ammonium methosulfate, and having higher yield pointOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0570US2009324532A1Hair conditioning composition containing a salt of cetyl trimethyl ammonium chloride, and having higher yield pointOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0669US2009324529A1Hair conditioning composition containing a salt of behenyl amidopropyl dimethylamine, and having higher yield pointOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0769US2009324527A1Hair conditioning composition containing behenyl trimethyl ammonium chloride, and having higher yield pointOKADA TOSHIYUKI·Filed 2009·Application pending·0 cites
- 0865US10695274B2Method for preparing personal care composition comprising surfactant system and high melting point fatty compoundOKADA TOSHIYUKI·Filed 2012·Granted Jun 30, 2020·2 cites·8 claims
- 0933US2012316239A1Method for preparing personal care composition comprising monoalkyl amine dual surfactant system and soluble saltOKADA TOSHIYUKI·Filed 2012·Application pending·0 cites
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