Assignee

OOKI HIROSHI

JP·1 granted patent·2 citations·filing 2009–2009

Technology mixG01M1 G03F1 H10P1

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0148US10222293B2Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method by detecting a light amount of measuring lightOOKI HIROSHI·Filed 2009·Granted Mar 5, 2019·2 cites·21 claims

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